Inventor · disambiguated record
Hiroo Kinoshita
Also filed as: KINOSHITA HIROO
9 granted patents·3 pending applications·441 citations·filing 1979–2014
90Inventor score
Top patents by PatentIndex Score
12 records- 0196US4528279AMonolithic catalyst for exhaust gas purificationTOYOTA MOTOR CO LTD·Filed 1984·Granted Jul 9, 1985·106 cites·5 claims
- 0296US4261862ACatalyst for purifying exhaust gas and a process for manufacturing thereofTOYOTA MOTOR CO LTD·Filed 1979·Granted Apr 14, 1981·90 cites·15 claims
- 0394US4274981ACatalyst for purifying exhaust gas and the process for manufacturing thereofTOYOTA MOTOR CO LTD·Filed 1980·Granted Jun 23, 1981·126 cites·7 claims
- 0490US4369132AExhaust gas purifying catalystTOYOTA MOTOR CO LTD·Filed 1980·Granted Jan 18, 1983·73 cites·14 claims
- 0579US4793201APorous static pressure guideNIPPON TELEGRAPH & TELEPHONE·Filed 1987·Granted Dec 27, 1988·37 cites·32 claims
- 0654US7858287B2Photosensitive resin, and photosensitive compositionHYOGO PREFECTURE·Filed 2007·Granted Dec 28, 2010·7 cites·7 claims
- 0748US7879528B2Resist composition for electron beam or EUVTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Feb 1, 2011·2 cites·7 claims
- 0847US2008160449A1Photoresist polymer having nano-smoothness and etching resistance, and resist compositionLION CORP·Filed 2008·Application pending·0 cites
- 0942US2016176666A1Paper feeding device and paper feeding methodMITSUBISHI HEAVY IND PRINTING·Filed 2014·Application pending·0 cites
- 1033US2009042123A1Calixresorcinarene compound, photoresist base comprising the same, and composition thereofKINOSHITA HIROO·Filed 2006·Application pending·0 cites
- 1132US7407734B2Resist composition for electron beam or EUVTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Aug 5, 2008·0 cites·9 claims
- 1230US7736842B2Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jun 15, 2010·0 cites·1 claims
Join the waitlist — get patent alerts
Get an alert when Hiroo Kinoshita files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →