Inventor

VISOKAY MARK R

US61 patents

⚠️ This page may combine multiple inventors who share the name “VISOKAY MARK R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VISOKAY MARK R

TEXAS INSTRUMENTS INC

Multiple work function gates

Annealing of high-k dielectric materials

Process for manufacturing dual work function metal gates in a microelectronics device

Gate structure and method

Gate dielectric and method

High temperature interface layer growth for high-k gate dielectric

Anneal sequence for high-κ film property optimization

Adhesion promoting sacrificial etch stop layer in advanced capacitor structures

High-k gate dielectric with uniform nitrogen profile and methods for making the same

Etchstop for integrated circuits

Method for fabricating transistor gate structures and gate dielectrics thereof

Method of making multiple work function gates by implanting metals with metallic alloying additives

Metal patterning with adhesive hardmask layer

Dual work function metal gate integration in semiconductor devices

Refractory metal-based electrodes for work function setting in semiconductor devices

Gate structure and method

Complementary transistors having respective gates formed from a metal and a corresponding metal-silicide

Integrated circuit capacitor and memory

Encapsulated low resistance gate structure and method for forming same

Top surface roughness reduction of high-k dielectric materials using plasma based processes

Formation of recessed polysilicon plugs using chemical-mechanical-polishing (CMP) and selective oxidation

Gate structure and method

Gate structure and method

Method for fabricating dual work function metal gates

Semiconductor device having multiple work functions and method of manufacture therefor

Hydrogen free integration of high-k gate dielectrics

Dual metal-alloy nitride gate electrodes

Method for manufacturing dual work function gate electrodes through local thickness-limited silicidation

Gate dielectric and method

Dual work function gate electrodes using doped polysilicon and a metal silicon germanium compound

Versatile system for triple-gated transistors with engineered corners

Dual metal-alloy nitride gate electrodes

Method and system for forming dual work function gate electrodes in a semiconductor device

Gate structure and method

Semiconductor device manufactured using a method to improve gate doping while maintaining good gate profile

Semiconductor device manufactured using a gate silicidation involving a disposable chemical/mechanical polishing stop layer

Method of enhancing drive current in a transistor

Method for controlling defects in gate dielectrics

Refractory metal-based electrodes for work function setting in semiconductor devices

Dual work function gate electrodes using doped polysilicon and a metal silicon germanium compound

Method of fabricating a semiconductor having dual gate electrodes using a composition-altered metal layer

Gate stack and gate stack etch sequence for metal gate integration

MICRON TECHNOLOGY INC

Methods of depositing a layer comprising tungsten and methods of forming a transistor gate line

Method of etching a substantially amorphous TA2O5 comprising layer

Methods for preparing ruthenium metal films

CVD of PtRh with good adhesion and morphology

TRUSTEES OF THE STANFORD LELAN

Method for producing uniaxial tetragonal thin films of ternary intermetallic compounds

UNIV LELAND STANFORD JUNIOR

Uniaxial thin film structures formed from oriented bilayers and multilayers

IBM

Method of fabricating an embedded polysilicon resistor and an embedded eFuse isolated from a substrate

LI ZHENGWEN

Selectively self-assembling oxygen diffusion barrier