Inventor · disambiguated record
Byung-Ho Ahn
Also filed as: AHN BYUNG-HO
7 granted patents·3 pending applications·33 citations·filing 2002–2018
82Inventor score
Top patents by PatentIndex Score
10 records- 0181US9666459B2Apparatus for processing wafersSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted May 30, 2017·7 cites·19 claims
- 0280US10965871B2Apparatus and method for compensating for image change caused by optical image stabilization motionSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Mar 30, 2021·3 cites·15 claims
- 0376US6828254B2Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 7, 2004·14 cites·7 claims
- 0474US10863091B2Method and apparatus for correcting influence of movements of electronic device on imageSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Dec 8, 2020·2 cites·11 claims
- 0566US11363199B2Apparatus and method for estimating optical image stabilization motionSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Jun 14, 2022·1 cites·13 claims
- 0662US6815370B2Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Nov 9, 2004·4 cites·11 claims
- 0756US9159591B2Batch type apparatus for manufacturing semiconductor devicesYANG CHEOL-KYU·Filed 2012·Granted Oct 13, 2015·2 cites·20 claims
- 0850US2008168946A1Liquid supplying unit and method, facility for treating substrates with the unit, and method for treating substratesSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 0944US2009107402A1Deposition apparatus and cleaning method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1039US2005127036A1Method of cleaning a reaction chamberSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
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