Inventor · disambiguated record
Dana Scranton
Also filed as: SCRANTON DANA · SCRANTON DANA R
12 granted patents·15 pending applications·190 citations·filing 1999–2008
92Inventor score
Top patents by PatentIndex Score
27 records- 0186US6395101B1Single semiconductor wafer processorSEMITOOL INC·Filed 1999·Granted May 28, 2002·68 cites·17 claims
- 0282US6374837B2Single semiconductor wafer processorSEMITOOL INC·Filed 2001·Granted Apr 23, 2002·23 cites·20 claims
- 0379US6502591B1Surface tension effect dryer with porous vessel wallsSEMITOOL INC·Filed 2000·Granted Jan 7, 2003·20 cites·29 claims
- 0476US6900132B2Single workpiece processing systemSEMITOOL INC·Filed 2003·Granted May 31, 2005·22 cites·26 claims
- 0573US7337663B2Sonic energy process chamberSEMITOOL INC·Filed 2005·Granted Mar 4, 2008·4 cites·24 claims
- 0669US6875284B2Side-specific cleaning method and apparatusSEMITOOL INC·Filed 2002·Granted Apr 5, 2005·11 cites·21 claims
- 0769US6427359B1Systems and methods for processing workpiecesSEMITOOL INC·Filed 2001·Granted Aug 6, 2002·13 cites·26 claims
- 0865US6668844B2Systems and methods for processing workpiecesSEMITOOL INC·Filed 2001·Granted Dec 30, 2003·12 cites·18 claims
- 0955US6681499B2Substrate drying method for use with a surface tension effect dryer with porous vessel wallsSEMITOOL INC·Filed 2003·Granted Jan 27, 2004·4 cites·19 claims
- 1052US6691720B2Multi-process system with pivoting process chamberSEMITOOL INC·Filed 2001·Granted Feb 17, 2004·9 cites·37 claims
- 1146US2005199277A1Side-specific cleaning apparatusFiled 2005·Application pending·0 cites
- 1245US2008083427A1Post etch residue removal from substratesSEMITOOL INC·Filed 2007·Application pending·0 cites
- 1343US2008202564A1Processing system with in-situ chemical solution generationSCRANTON DANA·Filed 2007·Application pending·0 cites
- 1442US2008060676A1Workpiece processing with preheatSCRANTON DANA·Filed 2006·Application pending·0 cites
- 1541US2007110895A1Single side workpiece processingRYE JASON·Filed 2007·Application pending·0 cites
- 1641US2004103919A1Single wafer cleaning with ozoneFiled 2003·Application pending·0 cites
- 1740US7005010B2Multi-process systemSEMITOOL INC·Filed 2003·Granted Feb 28, 2006·3 cites·20 claims
- 1840US2006118132A1Cleaning with electrically charged aerosolsBERGMAN ERIC J·Filed 2004·Application pending·0 cites
- 1939US6869486B2Methods for removing metallic contamination from wafer containersSEMITOOL INC·Filed 2003·Granted Mar 22, 2005·1 cites·16 claims
- 2039US2002157686A1Process and apparatus for treating a workpiece such as a semiconductor waferSEMITOOL INC·Filed 2001·Application pending·0 cites
- 2137US2003136429A1Vapor cleaning and liquid rinsing process vesselSEMITOOL INC·Filed 2002·Application pending·0 cites
- 2236US2003136431A1Method and apparatus for cleaning of microelectronic workpieces after chemical-mechanical planarizationSEMITOOL INC·Filed 2002·Application pending·0 cites
- 2335US2002139400A1Vertical process reactorSEMITOOL INC·Filed 2001·Application pending·0 cites
- 2432US2003062069A1Apparatus and methods for removing metallic contamination from wafer containersSEMITOOL INC·Filed 2002·Application pending·0 cites
- 2532US2010024847A1Semiconductor wafer cleaning with dilute acidsBREESE RONALD G·Filed 2008·Application pending·0 cites
- 2632US2004040583A1Workpiece processing systemSEMITOOL INC·Filed 2003·Application pending·0 cites
- 2728US2003051743A1Apparatus and methods for removing metallic contamination from wafer containersSEMITOOL INC·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →