Inventor · disambiguated record
Arthur H. Sato
Also filed as: SATO ARTHUR · SATO ARTHUR H
45 granted patents·2 pending applications·1,682 citations·filing 1995–2018
98Inventor score
Files withAPPLIED MATERIALS INC20LAM RES CORP19KIM JAEHYUN2APPPLIED MATERIALS INC1BENJAMIN NEIL MARTIN PAUL1
Top patents by PatentIndex Score
47 records- 0197US9620337B2Determining a malfunctioning device in a plasma systemLAM RES CORP·Filed 2014·Granted Apr 11, 2017·29 cites·22 claims
- 0297US6472822B1Pulsed RF power delivery for plasma processingAPPLIED MATERIALS INC·Filed 2000·Granted Oct 29, 2002·178 cites·34 claims
- 0397US6016131AInductively coupled plasma reactor with an inductive coil antenna having independent loopsAPPLIED MATERIALS INC·Filed 1999·Granted Jan 18, 2000·137 cites·63 claims
- 0497US5907221AInductively coupled plasma reactor with an inductive coil antenna having independent loopsAPPLIED MATERIALS INC·Filed 1995·Granted May 25, 1999·150 cites·15 claims
- 0596US6447636B1Plasma reactor with dynamic RF inductive and capacitive coupling controlAPPLIED MATERIALS INC·Filed 2000·Granted Sep 10, 2002·215 cites·43 claims
- 0696US6352049B1Plasma assisted processing chamber with separate control of species densityAPPLIED MATERIALS INC·Filed 1998·Granted Mar 5, 2002·498 cites·24 claims
- 0795US5919382AAutomatic frequency tuning of an RF power source of an inductively coupled plasma reactorAPPLIED MATERIALS INC·Filed 1996·Granted Jul 6, 1999·99 cites·56 claims
- 0893US10319570B2Determining a malfunctioning device in a plasma systemLAM RES CORP·Filed 2017·Granted Jun 11, 2019·5 cites·20 claims
- 0992US10134570B2Radiofrequency adjustment for instability management in semiconductor processingLAM RES CORP·Filed 2015·Granted Nov 20, 2018·7 cites·20 claims
- 1092US8692467B2Synchronized and shortened master-slave RF pulsing in a plasma processing chamberBENJAMIN NEIL MARTIN PAUL·Filed 2011·Granted Apr 8, 2014·17 cites·30 claims
- 1191US10297422B2Systems and methods for calibrating conversion models and performing position conversions of variable capacitors in match networks of plasma processing systemsLAM RES CORP·Filed 2016·Granted May 21, 2019·7 cites·33 claims
- 1291US6401652B1Plasma reactor inductive coil antenna with flat surface facing the plasmaAPPLIED MATERIALS INC·Filed 2000·Granted Jun 11, 2002·42 cites·42 claims
- 1390US9059101B2Radiofrequency adjustment for instability management in semiconductor processingLAM RES CORP·Filed 2013·Granted Jun 16, 2015·8 cites·20 claims
- 1488US10332725B2Systems and methods for reversing RF current polarity at one output of a multiple output RF matching networkLAM RES CORP·Filed 2015·Granted Jun 25, 2019·5 cites·18 claims
- 1584US10679825B2Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrateLAM RES CORP·Filed 2017·Granted Jun 9, 2020·3 cites·15 claims
- 1684US6447637B1Process chamber having a voltage distribution electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Sep 10, 2002·22 cites·12 claims
- 1783US9083182B2Bypass capacitors for high voltage bias power in the mid frequency RF rangeLAM RES CORP·Filed 2012·Granted Jul 14, 2015·5 cites·16 claims
- 1883US6291793B1Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminalAPPPLIED MATERIALS INC·Filed 1999·Granted Sep 18, 2001·34 cites·63 claims
- 1980US5801386AApparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using sameAPPLIED MATERIALS INC·Filed 1996·Granted Sep 1, 1998·36 cites·25 claims
- 2078US8736175B2Current control in plasma processing systemsLONG MAOLIN·Filed 2010·Granted May 27, 2014·4 cites·21 claims
- 2178US8519724B2Electrode for use in measuring dielectric properties of partsKIM JAEHYUN·Filed 2008·Granted Aug 27, 2013·7 cites·19 claims
- 2277US10879044B2Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsingLAM RES CORP·Filed 2018·Granted Dec 29, 2020·2 cites·15 claims
- 2377US7973539B1Methods for measuring dielectric properties of partsLAM RES CORP·Filed 2011·Granted Jul 5, 2011·3 cites·17 claims
- 2476US10347464B2Cycle-averaged frequency tuning for low power voltage mode operationLAM RES CORP·Filed 2015·Granted Jul 9, 2019·2 cites·9 claims
- 2576US9997381B2Hybrid edge ring for plasma wafer processingLAM RES CORP·Filed 2014·Granted Jun 12, 2018·3 cites·26 claims
- 2669US6504126B2Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regionsAPPLIED MATERIALS INC·Filed 2000·Granted Jan 7, 2003·5 cites·20 claims
- 2769US6369348B2Plasma reactor with coil antenna of plural helical conductors with equally spaced endsAPPLIED MATERIALS INC·Filed 2000·Granted Apr 9, 2002·5 cites·23 claims
- 2868US6356097B1Capacitive probe for in situ measurement of wafer DC bias voltageAPPLIED MATERIALS INC·Filed 1999·Granted Mar 12, 2002·33 cites·32 claims
- 2965US5565074APlasma reactor with a segmented balanced electrode for sputtering process materials from a target surfaceAPPLIED MATERIALS INC·Filed 1995·Granted Oct 15, 1996·30 cites·34 claims
- 3064US5683539AInductively coupled RF plasma reactor with floating coil antenna for reduced capacitive couplingAPPLIED MATERIALS INC·Filed 1995·Granted Nov 4, 1997·29 cites·28 claims
- 3163US9412670B2System, method and apparatus for RF power compensation in plasma etch chamberLAM RES CORP·Filed 2013·Granted Aug 9, 2016·2 cites·19 claims
- 3263US6373022B2Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetryAPPLIED MATERIALS INC·Filed 2000·Granted Apr 16, 2002·3 cites·25 claims
- 3362US9322795B2Electrode for use in measuring dielectric properties of partsLAM RES CORP·Filed 2013·Granted Apr 26, 2016·0 cites·16 claims
- 3462US8269510B2Apparatus for measuring dielectric properties of partsKIM JAEHYUN·Filed 2008·Granted Sep 18, 2012·2 cites·20 claims
- 3562US6297468B1Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminalAPPLIED MATERIALS INC·Filed 1997·Granted Oct 2, 2001·13 cites·49 claims
- 3661US7777500B2Methods for characterizing dielectric properties of partsLAM RES CORP·Filed 2008·Granted Aug 17, 2010·2 cites·10 claims
- 3760US8828259B2Methods for automatically determining capacitor values and systems thereofSATO ARTHUR H·Filed 2011·Granted Sep 9, 2014·1 cites·19 claims
- 3859US10438775B2Methods for automatically determining capacitor values and systems thereofLAM RES CORP·Filed 2014·Granted Oct 8, 2019·0 cites·11 claims
- 3958US5667701AMethod of measuring the amount of capacitive coupling of RF power in an inductively coupled plasmaAPPLIED MATERIALS INC·Filed 1995·Granted Sep 16, 1997·22 cites·20 claims
- 4056US9484214B2Systems and methods for improving wafer etch non-uniformity when using transformer-coupled plasmaLAM RES CORP·Filed 2014·Granted Nov 1, 2016·0 cites·24 claims
- 4153US10431426B2Gas plenum arrangement for improving etch non-uniformity in transformer-coupled plasma systemsLAM RES CORP·Filed 2016·Granted Oct 1, 2019·0 cites·10 claims
- 4249US6369349B2Plasma reactor with coil antenna of interleaved conductorsAPPLIED MATERIALS INC·Filed 2000·Granted Apr 9, 2002·3 cites·13 claims
- 4349US5942889ACapacitive probe for in situ measurement of wafer DC bias voltageAPPLIED MATERIALS INC·Filed 1997·Granted Aug 24, 1999·14 cites·14 claims
- 4446US7911213B2Methods for measuring dielectric properties of partsLAM RES CORP·Filed 2008·Granted Mar 22, 2011·0 cites·7 claims
- 4542US8597428B2Vacuum sealing radio frequency (RF) and low frequency conducting actuatorBROWN DANNY·Filed 2008·Granted Dec 3, 2013·0 cites·25 claims
- 4640US2003006009A1Process chamber having a voltage distribution electrodeAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 4734US2003003748A1Method of eliminating notching when anisotropically etching small linewidth openings in silicon on insulatorFiled 2001·Application pending·0 cites
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