Inventor · disambiguated record
Tomonori Yamaoka
Also filed as: YAMAOKA TOMONORI
20 granted patents·5 pending applications·98 citations·filing 1992–2024
93Inventor score
Top patents by PatentIndex Score
25 records- 0192US7601603B2Method for manufacturing semiconductor deviceDENSO CORP·Filed 2005·Granted Oct 13, 2009·10 cites·18 claims
- 0288US7811907B2Method for manufacturing semiconductor device and epitaxial growth equipmentDENSO CORP·Filed 2006·Granted Oct 12, 2010·14 cites·20 claims
- 0387USRE44236EMethod for manufacturing semiconductor deviceYAMAUCHI SHOICHI·Filed 2011·Granted May 21, 2013·4 cites·37 claims
- 0487US7642178B2Semiconductor device, method for manufacturing the same and method for evaluating the sameDENSO CORP·Filed 2006·Granted Jan 5, 2010·13 cites·7 claims
- 0582US7033843B2Semiconductor manufacturing method and semiconductor manufacturing apparatusMITSUBISHI MATERIAL SILICON·Filed 2003·Granted Apr 25, 2006·22 cites·8 claims
- 0673US6491758B1CVD apparatus equipped with moisture monitoringMITSUBISHI MATERIAL SILICON·Filed 2000·Granted Dec 10, 2002·11 cites·9 claims
- 0770US7364980B2Manufacturing method of semiconductor substrateSUMCO CORP·Filed 2006·Granted Apr 29, 2008·3 cites·20 claims
- 0867US8097511B2Semiconductor device having P-N column layer and method for manufacturing the sameSHIBATA TAKUMI·Filed 2008·Granted Jan 17, 2012·6 cites·22 claims
- 0959US9034721B2Method for manufacturing semiconductor substrateSUMCO CORP·Filed 2014·Granted May 19, 2015·0 cites·2 claims
- 1059US8956947B2Method for manufacturing semiconductor substrateSUMCO CORP·Filed 2014·Granted Feb 17, 2015·0 cites·9 claims
- 1159US2025109694A1Waste hydrogen power generation deviceEPICREW CORP·Filed 2024·Application pending·0 cites
- 1255US6887721B2Method of purging CVD apparatus and method for judging maintenance of times of semiconductor production apparatusesTAIYO NIPPON SANSO CORP·Filed 2001·Granted May 3, 2005·2 cites·6 claims
- 1352US6461447B1Substrate for epitaxial growthMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Oct 8, 2002·2 cites·3 claims
- 1452US2023351080A1Parameter determination device, parameter determination method, and parameter determination program for epitaxial growth systemEPICREW CORP·Filed 2023·Application pending·0 cites
- 1551US6776805B2Semiconductor manufacturing apparatus having a moisture measuring deviceMITSUBISHI MATERIAL SILICON·Filed 2001·Granted Aug 17, 2004·2 cites·16 claims
- 1649US2007108444A1Semiconductor substrate and manufacturing method thereofSUMCO CORP AND DENSO CORP·Filed 2006·Application pending·0 cites
- 1749US2009273102A1Semiconductor Substrate and Method for Manufacturing the SameNOGAMI SYOUJI·Filed 2006·Application pending·0 cites
- 1848US8835276B2Method for manufacturing semiconductor substrateNOGAMI SYOUJI·Filed 2010·Granted Sep 16, 2014·0 cites·2 claims
- 1947US2008001261A1Method for manufacturing a semiconductor substrateNOGAMI SYOUJI·Filed 2007·Application pending·0 cites
- 2042US9029606B2Method for producing 2-chloromethylbenzaldehyde, 2-chloromethylbenzaldehyde-containing composition, and method for storing sameTAKIMOTO MASASHI·Filed 2012·Granted May 12, 2015·0 cites·10 claims
- 2142US6794204B2Semiconductor manufacturing method and semiconductor manufacturing apparatusMITSUBISHI MATERIAL SILICON·Filed 2002·Granted Sep 21, 2004·0 cites·3 claims
- 2241US9272650B2Vehicle seat apparatusesTOYOTA BOSHOKU KK·Filed 2013·Granted Mar 1, 2016·1 cites·11 claims
- 2337US8937200B2Method for producing 2-(aryloxymethyl) benzaldehyde compoundHIROTA MASAJI·Filed 2012·Granted Jan 20, 2015·0 cites·3 claims
- 2433US5234843AMethod of making a semiconductor film where the hydrogen and/or fluorine is released prior to ion beam crystallizationNIPPON SHEET GLASS CO LTD·Filed 1992·Granted Aug 10, 1993·8 cites·1 claims
- 2532US9000225B2Method for producing 2-(aryloxymethyl) benzaldehyde compoundKAWAMURA MITSUNOBU·Filed 2012·Granted Apr 7, 2015·0 cites·6 claims
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