Inventor · disambiguated record
Carlos A. Fonseca
Also filed as: FONSECA CARLOS · FONSECA CARLOS A
32 granted patents·6 pending applications·328 citations·filing 2001–2023
97Inventor score
Top patents by PatentIndex Score
38 records- 0196US7829269B1Dual tone development with plural photo-acid generators in lithographic applicationsTOKYO ELECTRON LTD·Filed 2009·Granted Nov 9, 2010·32 cites·13 claims
- 0296US6777147B1Method for evaluating the effects of multiple exposure processes in lithographyIBM·Filed 2003·Granted Aug 17, 2004·86 cites·20 claims
- 0393US11775655B2Risk assessment of a container buildIBM·Filed 2021·Granted Oct 3, 2023·3 cites·18 claims
- 0493US11334333B1Generation of adaptive configuration files to satisfy complianceIBM·Filed 2020·Granted May 17, 2022·3 cites·20 claims
- 0593US8634810B2Pushing secure notifications to mobile computing devicesBARKIE ERIC J·Filed 2011·Granted Jan 21, 2014·29 cites·26 claims
- 0692US10048594B2Photo-sensitized chemically amplified resist (PS-CAR) model calibrationTOKYO ELECTRON LTD·Filed 2016·Granted Aug 14, 2018·5 cites·15 claims
- 0788US8129080B2Variable resist protecting groupsFONSECA CARLOS A·Filed 2009·Granted Mar 6, 2012·13 cites·19 claims
- 0887US11520564B2Intelligent recommendations for program codeIBM·Filed 2021·Granted Dec 6, 2022·2 cites·20 claims
- 0986US6901576B2Phase-width balanced alternating phase shift mask designIBM·Filed 2002·Granted May 31, 2005·26 cites·20 claims
- 1086US6757886B2Alternating phase shift mask design with optimized phase shapesIBM·Filed 2001·Granted Jun 29, 2004·23 cites·16 claims
- 1185US12112107B2Virtual metrology for wafer result predictionTOKYO ELECTRON LTD·Filed 2020·Granted Oct 8, 2024·2 cites·12 claims
- 1285US6964032B2Pitch-based subresolution assist feature designIBM·Filed 2003·Granted Nov 8, 2005·26 cites·20 claims
- 1385US6609245B2Priority coloring for VLSI designsIBM·Filed 2001·Granted Aug 19, 2003·24 cites·18 claims
- 1481US8197996B2Dual tone development processesFONSECA CARLOS A·Filed 2009·Granted Jun 12, 2012·6 cites·27 claims
- 1580US9711419B2Substrate backside texturingTOKYO ELECTRON LTD·Filed 2015·Granted Jul 18, 2017·3 cites·16 claims
- 1680US9615259B2Pushing secure notifications to mobile computing devicesIBM·Filed 2015·Granted Apr 4, 2017·3 cites·15 claims
- 1779US9281251B2Substrate backside texturingTOKYO ELECTRON LTD·Filed 2014·Granted Mar 8, 2016·3 cites·19 claims
- 1878US9253644B2Pushing secure notifications to mobile computing devicesIBM·Filed 2013·Granted Feb 2, 2016·3 cites·19 claims
- 1978US8283111B2Method for creating gray-scale features for dual tone development processesFONSECA CARLOS A·Filed 2008·Granted Oct 9, 2012·5 cites·11 claims
- 2076US6795961B2Priority coloring for VLSI designsIBM·Filed 2003·Granted Sep 21, 2004·13 cites·2 claims
- 2172US11346882B2Enhancement of yield of functional microelectronic devicesTOKYO ELECTRON LTD·Filed 2018·Granted May 31, 2022·1 cites·21 claims
- 2270US9786523B2Method and apparatus for substrate rinsing and dryingTOKYO ELECTRON LTD·Filed 2014·Granted Oct 10, 2017·2 cites·17 claims
- 2367US8574810B2Dual tone development with a photo-activated acid enhancement component in lithographic applicationsFONSECA CARLOS A·Filed 2009·Granted Nov 5, 2013·2 cites·20 claims
- 2457US8257911B2Method of process optimization for dual tone developmentGRONHEID ROEL·Filed 2008·Granted Sep 4, 2012·2 cites·20 claims
- 2557US7470489B2Method for designing alternating phase shift masksIBM·Filed 2004·Granted Dec 30, 2008·4 cites·31 claims
- 2656US6927005B2Alternating phase shift mask design with optimized phase shapesIBM·Filed 2004·Granted Aug 9, 2005·3 cites·3 claims
- 2756US6824932B2Self-aligned alternating phase shift mask patterning processIBM·Filed 2002·Granted Nov 30, 2004·4 cites·4 claims
- 2855US8568964B2Flood exposure process for dual tone development in lithographic applicationsFONSECA CARLOS A·Filed 2009·Granted Oct 29, 2013·0 cites·14 claims
- 2954US11435393B2Enhancement of yield of functional microelectronic devicesTOKYO ELECTRON LTD·Filed 2018·Granted Sep 6, 2022·0 cites·18 claims
- 3054US2025004845A1Optimizing usage and providing recommendations to users in a hybrid cloud environmentIBM·Filed 2023·Application pending·0 cites
- 3153US12254393B2Risk assessment of a container buildIBM·Filed 2021·Granted Mar 18, 2025·0 cites·18 claims
- 3252US2024311118A1Ai based operator install advisorIBM·Filed 2023·Application pending·0 cites
- 3351US11244873B2Systems and methods for manufacturing microelectronic devicesTOKYO ELECTRON LTD·Filed 2019·Granted Feb 8, 2022·0 cites·21 claims
- 3451US2022051129A1Blockchain-enabled model drift managementIBM·Filed 2020·Application pending·0 cites
- 3550US10943580B2Phonological clusteringIBM·Filed 2018·Granted Mar 9, 2021·0 cites·20 claims
- 3647US2016141169A1Substrate backside texturingTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 3745US2022291953A1Dynamically validating hosts using ai before scheduling a workload in a hybrid cloud environmentIBM·Filed 2021·Application pending·0 cites
- 3843US2010055624A1Method of patterning a substrate using dual tone developmentTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →