Inventor · disambiguated record
Katsuyoshi Aikawa
Also filed as: AIKAWA KATSUYOSHI
10 granted patents·5 pending applications·61 citations·filing 1998–2021
86Inventor score
Files withTOKYO ELECTRON LTD9MATSUURA HIROYUKI2TAISHO PHARMACEUTICAL CO LTD2AIKAWA KATSUYOSHI1KATO HITOSHI1
Top patents by PatentIndex Score
15 records- 0190US8394200B2Vertical plasma processing apparatus for semiconductor processMATSUURA HIROYUKI·Filed 2008·Granted Mar 12, 2013·10 cites·18 claims
- 0289US10072336B2Film forming apparatus, film forming method, and recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Sep 11, 2018·5 cites·8 claims
- 0387US8854449B2Substrate position detection apparatus, film deposition apparatus equipped with the same, and substrate position detection methodAIKAWA KATSUYOSHI·Filed 2011·Granted Oct 7, 2014·14 cites·10 claims
- 0478US9404184B2Substrate position detecting apparatus, substrate processing apparatus using substrate position detecting apparatus, and deposition apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Aug 2, 2016·4 cites·18 claims
- 0568US7022335B2Suppository of retaining in lower region of rectumTAISHO PHARMACEUTICAL CO LTD·Filed 2001·Granted Apr 4, 2006·3 cites·10 claims
- 0664US10683573B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jun 16, 2020·1 cites·3 claims
- 0760US2007240644A1Vertical plasma processing apparatus for semiconductor processMATSUURA HIROYUKI·Filed 2007·Application pending·0 cites
- 0858US6210698B1Suppository compositionTAISHO PHARMACEUTICAL CO LTD·Filed 1998·Granted Apr 3, 2001·24 cites·6 claims
- 0958US2010055312A1Film deposition apparatus, substrate processing apparatus, film deposition method, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1056US12394656B2Mounting table and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Aug 19, 2025·0 cites·8 claims
- 1154US11085113B2Film forming method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Aug 10, 2021·0 cites·5 claims
- 1252US10428425B2Film deposition apparatus, method of depositing film, and non-transitory computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2017·Granted Oct 1, 2019·0 cites·20 claims
- 1349US2010124610A1Substrate position detection apparatus, substrate position detection method, film deposition apparatus, film deposition method, and a computer readable storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1447US2017241018A1Film deposition apparatus, film deposition method and computer readable mediumTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1539US2013047923A1Film deposition apparatus, substrate processing apparatus, and plasma generating deviceKATO HITOSHI·Filed 2012·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →