Inventor · disambiguated record
Gi-Sung Yeo
Also filed as: YEO GI-SUNG
35 granted patents·10 pending applications·446 citations·filing 1994–2014
97Inventor score
Top patents by PatentIndex Score
45 records- 0197US7221031B2Semiconductor device having sufficient process margin and method of forming sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 22, 2007·115 cites·15 claims
- 0295US8003543B2Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Aug 23, 2011·21 cites·18 claims
- 0394US8278221B2Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the sameKOH CHA-WON·Filed 2011·Granted Oct 2, 2012·18 cites·20 claims
- 0494US7540970B2Methods of fabricating a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jun 2, 2009·27 cites·23 claims
- 0593US7873935B2Method of manufacturing a maskSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jan 18, 2011·16 cites·20 claims
- 0693US7732341B2Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 8, 2010·18 cites·21 claims
- 0793US7539970B2Method of manufacturing maskSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted May 26, 2009·15 cites·32 claims
- 0889US8026044B2Method of forming fine patterns of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 27, 2011·22 cites·20 claims
- 0986US7001697B2Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Feb 21, 2006·41 cites·36 claims
- 1085US7604907B2Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask setsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 20, 2009·8 cites·21 claims
- 1181US7687369B2Method of forming fine metal patterns for a semiconductor device using a damascene processSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Mar 30, 2010·7 cites·20 claims
- 1281US5759755ASemiconductor substrate containing anti-reflective layerSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Jun 2, 1998·54 cites·10 claims
- 1378US7862988B2Method for forming patterns of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jan 4, 2011·6 cites·21 claims
- 1477US7452825B2Method of forming a mask structure and method of forming a minute pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Nov 18, 2008·5 cites·12 claims
- 1576US7795099B2Semiconductor devices having Fin-type active areas and methods of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 14, 2010·5 cites·16 claims
- 1675US7787301B2Flash memory device using double patterning technology and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Aug 31, 2010·4 cites·12 claims
- 1772US7518704B2Multiple exposure apparatus and multiple exposure method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Apr 14, 2009·3 cites·12 claims
- 1868US7375390B2Semiconductor memory device having high electrical performance and mask and photolithography friendlinessSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 20, 2008·3 cites·5 claims
- 1967US9673195B2Semiconductor device having sufficient process margin and method of forming sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jun 6, 2017·1 cites·9 claims
- 2067US8193047B2Semiconductor device having sufficient process margin and method of forming sameRYOO MAN-HYOUNG·Filed 2010·Granted Jun 5, 2012·2 cites·20 claims
- 2166US8013375B2Semiconductor memory devices including diagonal bit linesSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Sep 6, 2011·4 cites·19 claims
- 2265US7582899B2Semiconductor device having overlay measurement mark and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Sep 1, 2009·3 cites·33 claims
- 2365US7259065B2Method of forming trench in semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Aug 21, 2007·2 cites·17 claims
- 2465US6537713B2Multilayer alignment keys and alignment method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Mar 25, 2003·12 cites·21 claims
- 2563US8013374B2Semiconductor memory devices including offset bit linesSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Sep 6, 2011·2 cites·16 claims
- 2663US7064051B2Method of forming self-aligned contact pads of non-straight type semiconductor memory deviceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jun 20, 2006·11 cites·15 claims
- 2756US7842451B2Method of forming patternSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Nov 30, 2010·0 cites·19 claims
- 2856US7670761B2Method of forming a fine pattern of a semiconductor device using a resist reflow measurement keySAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Mar 2, 2010·0 cites·20 claims
- 2955US7547936B2Semiconductor memory devices including offset active regionsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 16, 2009·1 cites·19 claims
- 3051US7176512B2Semiconductor memory device having high electrical performance and mask and photolithography friendlinessSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Feb 13, 2007·4 cites·14 claims
- 3151US2007190812A1Semiconductor device having sufficient process margin and method of forming sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 3248US7575855B2Method of forming patternSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Aug 18, 2009·0 cites·22 claims
- 3348US5593725AAnti-reflective layer and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1994·Granted Jan 14, 1997·15 cites·21 claims
- 3447US7723702B2E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 25, 2010·0 cites·13 claims
- 3546US2008169862A1Semiconductor device and methods for controlling its patternsSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 3645US2011156159A1Semiconductor device having sufficient process margin and method of forming sameRYOO MAN-HYOUNG·Filed 2011·Application pending·0 cites
- 3744US2007284623A1Semiconductor device having vertical channel transistorKIM SANG-JIN·Filed 2007·Application pending·0 cites
- 3844US2008076070A1Methods of Forming Fine Patterns In Integrated Circuits Using Atomic Layer DepositionSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3944US2007197014A1Method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 4043US7550383B2Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 23, 2009·0 cites·28 claims
- 4143US7221014B2DRAM devices having an increased density layoutSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 22, 2007·1 cites·20 claims
- 4243US2005089776A1Resist reflow measurement key and method of forming a fine pattern of a semiconductor device using the sameFiled 2004·Application pending·0 cites
- 4339US2007064232A1Method and system for measuring overlay of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 4438US2004212809A1Beam delivery methods, and systems, and wafer edge exposure apparatus delivering a plurality of laser beamsFiled 2004·Application pending·0 cites
- 4537US2010290285A1Flash Memory Device Using Double Patterning Technology and Method of Manufacturing the SameLEE DOO-YOUL·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →