Inventor · disambiguated record
Hiroki Futatsuya
Also filed as: FUTATSUYA HIROKI
11 granted patents·88 citations·filing 2003–2012
87Inventor score
Technology areasG03F
Top patents by PatentIndex Score
11 records- 0188US7047516B2Proximity effect correction apparatus, proximity effect correction method, storage medium, and computer program productFUJITSU LTD·Filed 2003·Granted May 16, 2006·38 cites·16 claims
- 0288US6862726B2Light intensity simulation method, program product, and designing method of photomaskFUJITSU LTD·Filed 2003·Granted Mar 1, 2005·35 cites·20 claims
- 0380US7562334B2Method for manufacturing a photomaskFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Jul 14, 2009·4 cites·1 claims
- 0480US7519943B2Photomask fabrication methodFUJITSU MICROELECTRONICS LTD·Filed 2006·Granted Apr 14, 2009·6 cites·9 claims
- 0558US7926003B2Method for manufacturing a photomaskFUJITSU SEMICONDUCTOR LTD·Filed 2009·Granted Apr 12, 2011·0 cites·3 claims
- 0657US7577556B2Method and equipment for simulationFUJITSU MICROELECTRONICS LTD·Filed 2004·Granted Aug 18, 2009·5 cites·5 claims
- 0754US8037427B2Method for manufacturing a photomaskFUJITSU SEMICONDUCTOR LTD·Filed 2011·Granted Oct 11, 2011·0 cites·1 claims
- 0853US8349541B2Semiconductor device manufacturing methodFUJITSU SEMICONDUCTOR LTD·Filed 2011·Granted Jan 8, 2013·0 cites·10 claims
- 0953US8349540B2Semiconductor device manufacturing methodFUJITSU SEMICONDUCTOR LTD·Filed 2007·Granted Jan 8, 2013·0 cites·13 claims
- 1052US8316328B2Apparatus for manufacturing a photomaskFUTATSUYA HIROKI·Filed 2012·Granted Nov 20, 2012·0 cites·1 claims
- 1150US8185848B2Apparatus for performing a manufacturing method of a photomaskFUTATSUYA HIROKI·Filed 2011·Granted May 22, 2012·0 cites·1 claims
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