Inventor · disambiguated record
Ryoichi Uemura
Also filed as: UEMURA RYOICHI
10 granted patents·1 pending application·41 citations·filing 1999–2018
85Inventor score
Top patents by PatentIndex Score
11 records- 0179US8242417B2Temperature control method of heat processing plate, computer storage medium, and temperature control apparatus of heat processing plateTADOKORO MASAHIDE·Filed 2007·Granted Aug 14, 2012·6 cites·15 claims
- 0277US9869941B2Substrate cleaning method, substrate cleaning apparatus, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Jan 16, 2018·2 cites·6 claims
- 0372US9570326B2Substrate cleaning method, substrate cleaning apparatus, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Feb 14, 2017·2 cites·6 claims
- 0472US7867673B2Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such programTOKYO ELECTRON LTD·Filed 2006·Granted Jan 11, 2011·4 cites·14 claims
- 0570US8698052B2Temperature control method of heat processing plate, computer storage medium, and temperature control apparatus of heat processing plateTADOKORO MASAHIDE·Filed 2012·Granted Apr 15, 2014·2 cites·20 claims
- 0667US7862966B2Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such programTOKYO ELECTRON LTD·Filed 2006·Granted Jan 4, 2011·2 cites·14 claims
- 0762US6402844B1Substrate processing method and substrate processing unitTOKYO ELECTRON LTD·Filed 1999·Granted Jun 11, 2002·23 cites·11 claims
- 0845US7867674B2Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such programTOKYO ELECTRON LTD·Filed 2006·Granted Jan 11, 2011·0 cites·11 claims
- 0942US10699919B2Coating processing apparatus and coating liquid collecting memberTOKYO ELECTRON LTD·Filed 2018·Granted Jun 30, 2020·0 cites·8 claims
- 1041US6921554B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Jul 26, 2005·0 cites·12 claims
- 1134US2001016225A1Coating film forming apparatus and coating film forming methodFiled 2001·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →