Inventor · disambiguated record
Francesco De Rege Thesauro
Also filed as: DE REGE THESAURO FRANCESCO
14 granted patents·9 pending applications·117 citations·filing 2002–2017
92Inventor score
Files withCABOT MICROELECTRONICS CORP12DE REGE THESAURO FRANCESCO4WARNER BENJAMIN P3CABOT MIRCROELECTRONICS CORP1EASTMAN CHEM CO1
Top patents by PatentIndex Score
23 records- 0189US8101093B2Chemical-mechanical polishing composition and method for using the sameDE REGE THESAURO FRANCESCO·Filed 2009·Granted Jan 24, 2012·10 cites·18 claims
- 0289US7316603B2Compositions and methods for tantalum CMPCABOT MICROELECTRONICS CORP·Filed 2005·Granted Jan 8, 2008·16 cites·39 claims
- 0387US7456107B2Compositions and methods for CMP of low-k-dielectric materialsCABOT MICROELECTRONICS CORP·Filed 2006·Granted Nov 25, 2008·15 cites·19 claims
- 0478US8691695B2CMP compositions and methods for suppressing polysilicon removal ratesMOEGGENBORG KEVIN·Filed 2010·Granted Apr 8, 2014·5 cites·6 claims
- 0577US8247327B2Methods and compositions for polishing silicon-containing substratesDE REGE THESAURO FRANCESCO·Filed 2008·Granted Aug 21, 2012·5 cites·16 claims
- 0676US7161247B2Polishing composition for noble metalsCABOT MICROELECTRONICS CORP·Filed 2004·Granted Jan 9, 2007·18 cites·26 claims
- 0772US7776230B2CMP system utilizing halogen adductCABOT MICROELECTRONICS CORP·Filed 2007·Granted Aug 17, 2010·3 cites·16 claims
- 0871US8597540B2Compositions for polishing silicon-containing substratesDE REGE THESAURO FRANCESCO·Filed 2012·Granted Dec 3, 2013·2 cites·4 claims
- 0969US8529680B2Compositions for CMP of semiconductor materialsDE REGE THESAURO FRANCESCO·Filed 2010·Granted Sep 10, 2013·2 cites·25 claims
- 1068US7160807B2CMP of noble metalsCABOT MICROELECTRONICS CORP·Filed 2003·Granted Jan 9, 2007·12 cites·32 claims
- 1168US6677266B1Process for preparing a vanadium/titanium catalyst and use in olefin polymerizationEASTMAN CHEM CO·Filed 2002·Granted Jan 13, 2004·9 cites·12 claims
- 1264US7563383B2CMP composition with a polymer additive for polishing noble metalsCABOT MIRCROELECTRONICS CORP·Filed 2004·Granted Jul 21, 2009·12 cites·18 claims
- 1362US7803203B2Compositions and methods for CMP of semiconductor materialsCABOT MICROELECTRONICS CORP·Filed 2007·Granted Sep 28, 2010·1 cites·25 claims
- 1456US7288021B2Chemical-mechanical polishing of metals in an oxidized formCABOT MICROELECTRONICS CORP·Filed 2004·Granted Oct 30, 2007·7 cites·30 claims
- 1552US2017251713A13d printer and method for printing an object using a curable liquidTELAMENS INC·Filed 2017·Application pending·0 cites
- 1651US2005211950A1Chemical-mechanical polishing composition and method for using the sameCABOT MICROELECTRONICS CORP·Filed 2004·Application pending·0 cites
- 1750US2008203059A1Dilutable cmp composition containing a surfactantCABOT MICROELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 1847US2011247996A1Dilutable cmp composition containing a surfactantCABOT MICROELECTRONICS CORP·Filed 2011·Application pending·0 cites
- 1946US2010276392A1Cmp system utilizing halogen adductCABOT MICROELECTRONICS CORP·Filed 2010·Application pending·0 cites
- 2043US2014197356A1Cmp compositions and methods for suppressing polysilicon removal ratesCABOT MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 2142US2018141277A1Method and Apparatus for Partitioning a MaterialWARNER BENJAMIN P·Filed 2017·Application pending·0 cites
- 2242US2018035689A1Method and Apparatus for Partitioning a MaterialWARNER BENJAMIN P·Filed 2017·Application pending·0 cites
- 2341US2017361525A1Method and Apparatus for Partitioning a MaterialWARNER BENJAMIN P·Filed 2017·Application pending·0 cites
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