Inventor · disambiguated record
Takayuki Toshima
Also filed as: TOSHIMA TAKAYUKI
74 granted patents·15 pending applications·968 citations·filing 1989–2019
99Inventor score
Files withTOKYO ELECTRON LTD66TOSHIMA TAKAYUKI6HIROSHIRO KOUKICHI2NAKAMORI MITSUNORI2TANAKA TAKASHI2
Top patents by PatentIndex Score
89 records- 0195US6514073B1Resist processing method and resist processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Feb 4, 2003·61 cites·4 claims
- 0292US6709523B1Silylation treatment unit and methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 23, 2004·53 cites·14 claims
- 0390US7998308B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Aug 16, 2011·16 cites·12 claims
- 0489US7482281B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2006·Granted Jan 27, 2009·14 cites·22 claims
- 0589US6634806B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Oct 21, 2003·39 cites·18 claims
- 0688US10115609B2Separation and regeneration apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Oct 30, 2018·6 cites·8 claims
- 0788US6613692B1Substrate processing method and apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Sep 2, 2003·35 cites·13 claims
- 0886US6551400B2Coating apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Apr 22, 2003·21 cites·7 claims
- 0986US6228561B1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 1997·Granted May 8, 2001·36 cites·17 claims
- 1086US4899686ACoating deviceTOKYO ELECTRON LTD·Filed 1989·Granted Feb 13, 1990·49 cites·10 claims
- 1185US8701308B2Fluid heater, manufacturing method thereof, substrate processing apparatus including fluid heater, and substrate processing methodHIROSHIRO KOUKICHI·Filed 2009·Granted Apr 22, 2014·14 cites·18 claims
- 1284US9881784B2Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jan 30, 2018·4 cites·12 claims
- 1384US9662685B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted May 30, 2017·5 cites·5 claims
- 1484US6503003B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Jan 7, 2003·19 cites·5 claims
- 1584US5730162AApparatus and method for washing substratesTOKYO ELECTRON LTD·Filed 1996·Granted Mar 24, 1998·67 cites·4 claims
- 1683US10046370B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 14, 2018·3 cites·3 claims
- 1783US6817790B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Nov 16, 2004·23 cites·18 claims
- 1882US8434423B2Substrate carrying apparatus having circumferential sidewall and substrate processing systemTOSHIMA TAKAYUKI·Filed 2010·Granted May 7, 2013·6 cites·6 claims
- 1982US7793610B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Sep 14, 2010·8 cites·20 claims
- 2082US6620260B2Substrate rinsing and drying methodTOKYO ELECTRON LTD·Filed 2001·Granted Sep 16, 2003·28 cites·8 claims
- 2182US6536452B1Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 25, 2003·28 cites·30 claims
- 2281US8372212B2Supercritical drying method and apparatus for semiconductor substratesTOSHIBA KK·Filed 2012·Granted Feb 12, 2013·5 cites·5 claims
- 2381US6491452B2Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Dec 10, 2002·16 cites·3 claims
- 2480US8465596B2Supercritical processing apparatus and supercritical processing methodTOSHIMA TAKAYUKI·Filed 2011·Granted Jun 18, 2013·5 cites·9 claims
- 2579US8771429B2Supercritical drying method for semiconductor substrate and supercritical drying apparatusJI LINAN·Filed 2012·Granted Jul 8, 2014·5 cites·8 claims
- 2679US6713239B2Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Mar 30, 2004·14 cites·10 claims
- 2779US5817185AMethod for washing substratesTOKYO ELECTRON LTD·Filed 1997·Granted Oct 6, 1998·48 cites·7 claims
- 2878US7849864B2Liquid processing systemTOKYO ELECTRON LTD·Filed 2007·Granted Dec 14, 2010·6 cites·20 claims
- 2978US6869499B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Mar 22, 2005·15 cites·13 claims
- 3077US6817368B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Nov 16, 2004·17 cites·4 claims
- 3176US6238848B1Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted May 29, 2001·12 cites·6 claims
- 3275US6656273B1Film forming method and film forming systemTOKYO ELECTRON LTD·Filed 2000·Granted Dec 2, 2003·18 cites·3 claims
- 3374US5928390AVertical processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Jul 27, 1999·45 cites·49 claims
- 3473US9583330B2Supercritical drying method for semiconductor substrate and supercritical drying apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Feb 28, 2017·2 cites·4 claims
- 3573US8235061B2Substrate processing apparatus and substrate processing methodTOSHIMA TAKAYUKI·Filed 2010·Granted Aug 7, 2012·3 cites·15 claims
- 3673US7472713B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Jan 6, 2009·4 cites·3 claims
- 3772US11355362B2Washing method, washing device, storage medium, and washing compositionTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Jun 7, 2022·1 cites·13 claims
- 3872US6688020B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Feb 10, 2004·14 cites·9 claims
- 3971US11441101B2Cleaning composition, cleaning method, and method for manufacturing semiconductorTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Sep 13, 2022·1 cites·13 claims
- 4071US8303724B2Substrate processing method and non-transitory storage medium for carrying out such methodHIROSHIRO KOUKICHI·Filed 2011·Granted Nov 6, 2012·2 cites·10 claims
- 4171US5633040AMethod and apparatus for treating film coated on substrateTOKYO ELECTRON LTD·Filed 1994·Granted May 27, 1997·26 cites·13 claims
- 4269US9421569B2Plating apparatus, plating method and storage mediumTANAKA TAKASHI·Filed 2012·Granted Aug 23, 2016·2 cites·6 claims
- 4368US7063094B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Jun 20, 2006·11 cites·12 claims
- 4468US5932380AMethod of processing resist utilizing alkaline component monitoringTOKYO ELECTRON LTD·Filed 1997·Granted Aug 3, 1999·29 cites·26 claims
- 4567US9076643B2Supercritical processing apparatus, substrate processing system and supercritical processing methodTOSHIMA TAKAYUKI·Filed 2010·Granted Jul 7, 2015·2 cites·8 claims
- 4665US6017663AMethod of processing resist utilizing alkaline component monitoringTOKYO ELECTRON LTD·Filed 1999·Granted Jan 25, 2000·25 cites·28 claims
- 4764US10207349B2High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure containerTOKYO ELECTRON LTD·Filed 2013·Granted Feb 19, 2019·1 cites·14 claims
- 4864US6097469AMethod of processing resist onto substrate and resist processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Aug 1, 2000·24 cites·17 claims
- 4963US10096462B2Substrate processing method and storage mediumTOSHIBA KK·Filed 2013·Granted Oct 9, 2018·1 cites·7 claims
- 5063US8015984B2Substrate processing apparatus including a drying mechanism using a fluid mixture of purified water and a volatile organic solventTOKYO ELECTRON LTD·Filed 2006·Granted Sep 13, 2011·1 cites·9 claims
Showing the top 50 of 89 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →