Inventor · disambiguated record
Deborah J. Riley
Also filed as: RILEY DEBORAH · RILEY DEBORAH J · RILEY DEBORAH JEAN
24 granted patents·3 pending applications·105 citations·filing 2000–2019
94Inventor score
Files withTEXAS INSTRUMENTS INC20ADVANCED MICRO DEVICES INC1CHOI YOUN SUNG1JAIN AMITABH1MICROSOL TECH INC1
Top patents by PatentIndex Score
27 records- 0189US8927385B2ZTCR poly resistor in replacement gate flowTEXAS INSTRUMENTS INC·Filed 2012·Granted Jan 6, 2015·11 cites·10 claims
- 0289US7098099B1Semiconductor device having optimized shallow junction geometries and method for fabrication thereofTEXAS INSTRUMENTS INC·Filed 2005·Granted Aug 29, 2006·20 cites·18 claims
- 0384US8877581B2Strain-engineered MOSFETs having rimmed source-drain recessesJAIN AMITABH·Filed 2010·Granted Nov 4, 2014·8 cites·20 claims
- 0480US7732284B1Post high-k dielectric/metal gate cleanTEXAS INSTRUMENTS INC·Filed 2008·Granted Jun 8, 2010·7 cites·17 claims
- 0580US7537988B2Differential offset spacerTEXAS INSTRUMENTS INC·Filed 2007·Granted May 26, 2009·8 cites·20 claims
- 0677US8043921B2Nitride removal while protecting semiconductor surfaces for forming shallow junctionsTEXAS INSTRUMENTS INC·Filed 2010·Granted Oct 25, 2011·4 cites·19 claims
- 0775US7384869B2Protection of silicon from phosphoric acid using thick chemical oxideTEXAS INSTRUMENTS INC·Filed 2005·Granted Jun 10, 2008·5 cites·17 claims
- 0874US10026837B2Embedded SiGe process for multi-threshold PMOS transistorsTEXAS INSTRUMENTS INC·Filed 2015·Granted Jul 17, 2018·2 cites·11 claims
- 0974US9093555B2Method of CMOS manufacturing utilizing multi-layer epitaxial hardmask films for improved EPI profileTEXAS INSTRUMENTS INC·Filed 2013·Granted Jul 28, 2015·3 cites·20 claims
- 1070US8691644B2Method of forming a CMOS device with a stressed-channel NMOS transistor and a strained-channel PMOS transistorSONG SEUNG-CHUL·Filed 2012·Granted Apr 8, 2014·3 cites·20 claims
- 1169US6492275B2Control of transistor performance through adjustment of spacer oxide profile with a wet etchADVANCED MICRO DEVICES INC·Filed 2000·Granted Dec 10, 2002·14 cites·19 claims
- 1268US9263444B2Devices having inhomogeneous silicide schottky barrier contactsTEXAS INSTRUMENTS INC·Filed 2014·Granted Feb 16, 2016·2 cites·14 claims
- 1366US9385117B2NPN heterojunction bipolar transistor in CMOS flowTEXAS INSTRUMENTS INC·Filed 2014·Granted Jul 5, 2016·1 cites·11 claims
- 1465US8470707B2Silicide methodXIONG WEIZE·Filed 2011·Granted Jun 25, 2013·2 cites·13 claims
- 1563US7422969B2Multi-step process for patterning a metal gate electrodeTEXAS INSTRUMENTS INC·Filed 2007·Granted Sep 9, 2008·1 cites·8 claims
- 1660US11004612B2Low temperature sub-nanometer periodic stack dielectricsMICROSOL TECH INC·Filed 2019·Granted May 11, 2021·1 cites·8 claims
- 1760US7569464B2Method for manufacturing a semiconductor device having improved across chip implant uniformityTEXAS INSTRUMENTS INC·Filed 2006·Granted Aug 4, 2009·2 cites·18 claims
- 1859US7323403B2Multi-step process for patterning a metal gate electrodeTEXAS INSTR INCROPORATED·Filed 2004·Granted Jan 29, 2008·6 cites·8 claims
- 1952US7371691B2Silicon recess improvement through improved post implant resist removal and cleansTEXAS INSTRUMENTS INC·Filed 2004·Granted May 13, 2008·3 cites·14 claims
- 2051US11417646B2NPN heterojunction bipolar transistor in CMOS flowTEXAS INSTRUMENTS INC·Filed 2016·Granted Aug 16, 2022·0 cites·15 claims
- 2151US2018308977A1Embedded sige process for multi-threshold pmos transistorsTEXAS INSTRUMENTS INC·Filed 2018·Application pending·0 cites
- 2248US2010032813A1Ic formed with densified chemical oxide layerTEXAS INSTRUMENTS INC·Filed 2009·Application pending·0 cites
- 2347US9659825B2Method of CMOS manufacturing utilizing multi-layer epitaxial hardmask films for improved epi profileTEXAS INSTRUMENTS INC·Filed 2015·Granted May 23, 2017·0 cites·20 claims
- 2446US7132365B2Treatment of silicon prior to nickel silicide formationTEXAS INSTRUMENTS INC·Filed 2004·Granted Nov 7, 2006·2 cites·10 claims
- 2544US9780001B2Devices having inhomogeneous silicide schottky barrier contactsTEXAS INSTRUMENTS INC·Filed 2016·Granted Oct 3, 2017·0 cites·18 claims
- 2642US9224656B2Method of CMOS manufacturing utilizing multi-layer epitaxial hardmask films for improved gate spacer controlTEXAS INSTRUMENTS INC·Filed 2013·Granted Dec 29, 2015·0 cites·19 claims
- 2737US2014054710A1Reduction of Proximity Effects in Field-Effect Transistors with Embedded Silicon-Germanium Source and Drain RegionsCHOI YOUN SUNG·Filed 2012·Application pending·0 cites
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