Inventor · disambiguated record
Tadashi Fukase
Also filed as: FUKASE TADASHI
10 granted patents·4 pending applications·521 citations·filing 1992–2009
91Inventor score
Top patents by PatentIndex Score
14 records- 0197US6841880B2Semiconductor device and method of fabricating semiconductor device with high CMP uniformity and resistance to loss that occurs in dicingNEC ELECTRONICS CORP·Filed 2003·Granted Jan 11, 2005·294 cites·9 claims
- 0283US6876064B2Semiconductor device having superior resistance to moistureNEC ELECTRONICS CORP·Filed 2004·Granted Apr 5, 2005·36 cites·14 claims
- 0375US5578524AFabrication process of a semiconductor device with a wiring structureNEC CORP·Filed 1995·Granted Nov 26, 1996·52 cites·20 claims
- 0473US5728595AMethod of fabricating a self-aligned contact hole for a semiconductor deviceNEC CORP·Filed 1996·Granted Mar 17, 1998·46 cites·19 claims
- 0567US5384287AMethod of forming a semiconductor device having self-aligned contact holesNEC CORP·Filed 1992·Granted Jan 24, 1995·40 cites·3 claims
- 0662US5656529AMethod for manufacturing highly-integrated capacitorNEC CORP·Filed 1996·Granted Aug 12, 1997·22 cites·12 claims
- 0755US5773342AMethod for forming a storage node in a semiconductor memory using ion implantation to form a smooth amorphous polycrystalline filmNEC CORP·Filed 1997·Granted Jun 30, 1998·14 cites·20 claims
- 0845US2008093699A1Semiconductor device and method of manufacturing the sameNEC ELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 0944US2010001352A1Semiconductor device and method of manufacturing the sameNEC ELECTRONICS CORP·Filed 2009·Application pending·0 cites
- 1043US6261897B1Method of manufacturing a semiconductor deviceNEC CORP·Filed 1999·Granted Jul 17, 2001·7 cites·26 claims
- 1140US6133115AFormation of gate electrodeNEC CORP·Filed 1999·Granted Oct 17, 2000·9 cites·14 claims
- 1237US2004155350A1Semiconductor device having multi-layer interconnection structureFiled 2004·Application pending·0 cites
- 1335US2001005610A1Semiconductor device having metal silicide film and manufacturing method thereofFiled 2000·Application pending·0 cites
- 1430US5691222AMethod of manufacturing semiconductor integrated circuit device having a capacitor electrodeNEC CORP·Filed 1996·Granted Nov 25, 1997·1 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →