Inventor · disambiguated record
Naoki Yasui
Also filed as: YASUI NAOKI
39 granted patents·14 pending applications·1,472 citations·filing 1996–2025
98Inventor score
Top patents by PatentIndex Score
53 records- 0198US11978612B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Granted May 7, 2024·3 cites·16 claims
- 0297US8497213B2Plasma processing methodYASUI NAOKI·Filed 2008·Granted Jul 30, 2013·469 cites·10 claims
- 0394US7373899B2Plasma processing apparatus using active matchingHITACHI HIGH TECH CORP·Filed 2004·Granted May 20, 2008·46 cites·14 claims
- 0491US2025357080A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2025·Application pending·0 cites
- 0590US7169255B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Jan 30, 2007·30 cites·3 claims
- 0689US11424105B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Aug 23, 2022·3 cites·13 claims
- 0789US10755897B2Plasma processing apparatus and plasma processing methodHITACHI HIGH-TECH CORP·Filed 2018·Granted Aug 25, 2020·5 cites·4 claims
- 0889US9336999B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Granted May 10, 2016·7 cites·9 claims
- 0988US6875366B2Plasma processing apparatus and method with controlled biasing functionsHITACHI LTD·Filed 2001·Granted Apr 5, 2005·22 cites·17 claims
- 1087US8075733B2Plasma processing apparatusWATANABE SEIICHI·Filed 2008·Granted Dec 13, 2011·11 cites·5 claims
- 1186US12444572B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2024·Granted Oct 14, 2025·0 cites·7 claims
- 1285US7029594B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Apr 18, 2006·19 cites·12 claims
- 1384US10665516B2Etching method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted May 26, 2020·3 cites·8 claims
- 1484US9741579B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Granted Aug 22, 2017·5 cites·4 claims
- 1583US12094687B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2021·Granted Sep 17, 2024·1 cites·13 claims
- 1683US7615132B2Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing methodHITACHI HIGH TECH CORP·Filed 2004·Granted Nov 10, 2009·16 cites·8 claims
- 1782US8992724B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2013·Granted Mar 31, 2015·5 cites·10 claims
- 1881US9502217B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 22, 2016·3 cites·4 claims
- 1980US10460913B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Granted Oct 29, 2019·3 cites·12 claims
- 2080US5725477AFront end structure of endoscopeASAHI OPTICAL CO LTD·Filed 1996·Granted Mar 10, 1998·236 cites·1 claims
- 2179US6806201B2Plasma processing apparatus and method using active matchingHITACHI LTD·Filed 2001·Granted Oct 19, 2004·12 cites·10 claims
- 2278US10217613B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Feb 26, 2019·3 cites·10 claims
- 2374US9390941B2Sample processing apparatus, sample processing system, and method for processing sampleWATANABE SEIICHI·Filed 2010·Granted Jul 12, 2016·5 cites·16 claims
- 2473US11081320B2Plasma processing apparatus, plasma processing method, and ECR height monitorHITACHI HIGH TECH CORP·Filed 2019·Granted Aug 3, 2021·1 cites·9 claims
- 2573US10699884B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Jun 30, 2020·1 cites·4 claims
- 2671US5725474AFront end structure of endoscopeASAHI OPTICAL CO LTD·Filed 1996·Granted Mar 10, 1998·180 cites·2 claims
- 2770US5725476AFront end structure of endoscopeASAHI OPTICAL CO LTD·Filed 1996·Granted Mar 10, 1998·170 cites·2 claims
- 2869US11355315B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Granted Jun 7, 2022·1 cites·4 claims
- 2961US5746695AFront end structure of endoscopeASAHI OPTICAL CO LTD·Filed 1996·Granted May 5, 1998·91 cites·3 claims
- 3060US11094512B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Aug 17, 2021·0 cites·2 claims
- 3160US11004658B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted May 11, 2021·0 cites·7 claims
- 3260US2009165955A1Plasma processing apparatus and method with controlled biasing functionsSUMIYA MASAHIRO·Filed 2009·Application pending·0 cites
- 3356US10192718B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted Jan 29, 2019·0 cites·14 claims
- 3455US11152192B2Plasma processing apparatus and methodHITACHI HIGH TECH CORP·Filed 2018·Granted Oct 19, 2021·0 cites·7 claims
- 3555US8142674B2Plasma processing apparatus and plasma processing methodTAMURA HITOSHI·Filed 2009·Granted Mar 27, 2012·0 cites·4 claims
- 3655US2007186856A1Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing methodYASUI NAOKI·Filed 2007·Application pending·0 cites
- 3754US5733244ADistal end part of endoscopeASAHI OPTICAL CO LTD·Filed 1996·Granted Mar 31, 1998·69 cites·18 claims
- 3853US2005155711A1Plasma processing apparatus and method with controlled biasing functionsFiled 2005·Application pending·0 cites
- 3952US2005126712A1Plasma processing methodFiled 2005·Application pending·0 cites
- 4049US5725475AFront end structure of endoscopeASAHI OPTICAL CO LTD·Filed 1996·Granted Mar 10, 1998·52 cites·1 claims
- 4148US2007193976A1Plasma processing apparatus and plasma processing methodTAMURA HITOSHI·Filed 2006·Application pending·0 cites
- 4247US7807581B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2007·Granted Oct 5, 2010·0 cites·7 claims
- 4347US2014011365A1Plasma processing apparatus and methodYASUI NAOKI·Filed 2012·Application pending·0 cites
- 4447US2004050495A1Plasma processing apparatus and plasma processing methodFiled 2003·Application pending·0 cites
- 4547US2012145323A1Plasma Processing Apparatus and Plasma Processing MethodTAMURA HITOSHI·Filed 2012·Application pending·0 cites
- 4643US2015170886A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Application pending·0 cites
- 4739US12347656B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Jul 1, 2025·0 cites·6 claims
- 4839US2008023139A1Plasma processing apparatus and plasma processing methodYASUI NAOKI·Filed 2006·Application pending·0 cites
- 4939US2007218696A1Dry etching methodKUWABARA KENICHI·Filed 2006·Application pending·0 cites
- 5039US2014220489A1Method for processing sample and sample processing apparatusHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
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