Inventor · disambiguated record
Shoichiro Yasunami
Also filed as: YASUNAMI SHOICHIRO
35 granted patents·4 pending applications·787 citations·filing 1990–2007
97Inventor score
Top patents by PatentIndex Score
39 records- 0196US5707756ANon-aqueous secondary batteryFUJI PHOTO FILM CO LTD·Filed 1997·Granted Jan 13, 1998·255 cites·15 claims
- 0294US6001139ANonaqueous secondary battery having multiple-layered negative electrodeFUJI PHOTO FILM CO LTD·Filed 1996·Granted Dec 14, 1999·121 cites·17 claims
- 0389US6555289B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Apr 29, 2003·35 cites·7 claims
- 0487US5686203ANon-aqueous secondary batteryFUJI PHOTO FILM CO LTD·Filed 1995·Granted Nov 11, 1997·86 cites·23 claims
- 0586US6852467B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Feb 8, 2005·25 cites·20 claims
- 0686US6296985B1Positive photoresist composition comprising a polysiloxaneFUJI PHOTO FILM CO LTD·Filed 2000·Granted Oct 2, 2001·27 cites·2 claims
- 0780US6589705B1Positive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Jul 8, 2003·19 cites·10 claims
- 0879US6371995B1Nonaqueous secondary battery and method for preparing sameFUJI PHOTO FILM CO LTD·Filed 1997·Granted Apr 16, 2002·35 cites·13 claims
- 0978US6387590B1Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted May 14, 2002·13 cites·13 claims
- 1077US6777161B2Lower layer resist composition for silicon-containing two-layer resistFUJI PHOTO FILM CO LTD·Filed 2002·Granted Aug 17, 2004·14 cites·14 claims
- 1176US6696219B2Positive resist laminateFUJI PHOTO FILM CO LTD·Filed 2001·Granted Feb 24, 2004·15 cites·16 claims
- 1275US6270941B1Positive silicone-containing photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Aug 7, 2001·14 cites·3 claims
- 1364US7083892B2Resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Aug 1, 2006·6 cites·12 claims
- 1463US6773862B2Negative resist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Aug 10, 2004·18 cites·16 claims
- 1560US6902862B2Resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Jun 7, 2005·16 cites·20 claims
- 1659US7232640B1Positive resist compositionFUJIFILM CORP·Filed 2004·Granted Jun 19, 2007·5 cites·13 claims
- 1759US5153115ASilver halide photographic materials and method for manufacture thereofFUJI PHOTO FILM CO LTD·Filed 1991·Granted Oct 6, 1992·5 cites·8 claims
- 1858US5237031AOrganic solid electrolyteFUJI PHOTO FILM CO LTD·Filed 1991·Granted Aug 17, 1993·26 cites·8 claims
- 1955US5340672ASecondary batteryFUJI PHOTO FILM CO LTD·Filed 1993·Granted Aug 23, 1994·24 cites·18 claims
- 2053US7326513B2Positive working resist compositionFUJIFILM CORP·Filed 2004·Granted Feb 5, 2008·3 cites·10 claims
- 2150US2006147837A1Resist compositionFUJI PHOTO FILM CO LTD·Filed 2006·Application pending·0 cites
- 2249US7090960B2Negative resist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Aug 15, 2006·2 cites·16 claims
- 2348US8080362B2Positive resist compositionSHIRAKAWA KOJI·Filed 2007·Granted Dec 20, 2011·0 cites·10 claims
- 2448US5250409ASilver halide photographic materialFUJI PHOTO FILM CO LTD·Filed 1992·Granted Oct 5, 1993·3 cites·8 claims
- 2547US6346363B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Feb 12, 2002·1 cites·16 claims
- 2647US5350648ANonaqueous secondary batteryFUJI PHOTO FILM CO LTD·Filed 1993·Granted Sep 27, 1994·16 cites·6 claims
- 2744US7361446B2Positive resist compositionFUJIFILM CORP·Filed 2004·Granted Apr 22, 2008·0 cites·14 claims
- 2841US6479213B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Nov 12, 2002·0 cites·9 claims
- 2939US7332258B2Positive resist composition and process for forming pattern using the sameFUJIFILM CORP·Filed 2004·Granted Feb 19, 2008·0 cites·11 claims
- 3038US7351515B2Positive resist composition and pattern-forming method using the sameFUJIFILM CORP·Filed 2004·Granted Apr 1, 2008·2 cites·9 claims
- 3138US7105273B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Sep 12, 2006·0 cites·6 claims
- 3237US6746813B2Negative resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Jun 8, 2004·0 cites·10 claims
- 3337US2004053160A1Resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Application pending·0 cites
- 3436US2003054287A1Resist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Application pending·0 cites
- 3536US2003165772A1Negative resist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Application pending·0 cites
- 3634US7432034B2Negative resist compositionFUJIFILM CORP·Filed 2003·Granted Oct 7, 2008·1 cites·17 claims
- 3731US7217493B2Positive resist compositionFUJIFILM CORP·Filed 2004·Granted May 15, 2007·0 cites·8 claims
- 3831US5108885ASilver halide photographic material containing crosslinked polymerFUJI PHOTO FILM CO LTD·Filed 1990·Granted Apr 28, 1992·0 cites·9 claims
- 3930US6887647B2Negative-working resist composition for electron beams or x-raysFUJI PHOTO FILM CO LTD·Filed 2002·Granted May 3, 2005·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →