Inventor · disambiguated record
William A. Enichen
Also filed as: ENICHEN WILLIAM A · ENICHEN WILLIAM ALBERT
13 granted patents·234 citations·filing 1993–2005
92Inventor score
Top patents by PatentIndex Score
13 records- 0183US5301124ARegistration of patterns formed of multiple fieldsIBM·Filed 1993·Granted Apr 5, 1994·46 cites·9 claims
- 0281US5552611APseudo-random registration masks for projection lithography toolIBM·Filed 1995·Granted Sep 3, 1996·40 cites·16 claims
- 0379US7391023B2Lithography tool image quality evaluating and correctingIBM·Filed 2005·Granted Jun 24, 2008·4 cites·8 claims
- 0479US5621216AHardware/software implementation for multipass E-beam mask writingIBM·Filed 1996·Granted Apr 15, 1997·39 cites·7 claims
- 0579US5585629AElectron beam nano-metrology systemIBM·Filed 1996·Granted Dec 17, 1996·36 cites·11 claims
- 0659US6040095AMeasurement marks for e-beam projection mask and method of usingNIKON CORP·Filed 1998·Granted Mar 21, 2000·23 cites·17 claims
- 0759US5763894ACalibration patterns and techniques for charged particle projection lithography systemsIBM·Filed 1997·Granted Jun 9, 1998·14 cites·19 claims
- 0854US5570405ARegistration and alignment technique for X-ray mask fabricationIBM·Filed 1995·Granted Oct 29, 1996·18 cites·15 claims
- 0948US6320187B1Magnification and rotation calibration patterns for particle beam projection systemNIKON CORP·Filed 1999·Granted Nov 20, 2001·8 cites·31 claims
- 1045US6388516B1Precision high speed magnetic coil driver circuitIBM·Filed 2000·Granted May 14, 2002·4 cites·14 claims
- 1144US6931337B2Lithography tool image quality evaluating and correctingIBM·Filed 2003·Granted Aug 16, 2005·0 cites·14 claims
- 1232US6201251B1Compensation of space charge in a particle beam systemNIKON CORP·Filed 1998·Granted Mar 13, 2001·1 cites·20 claims
- 1330US5838013AMethod for monitoring resist charging in a charged particle systemIBM·Filed 1996·Granted Nov 17, 1998·1 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →