Inventor · disambiguated record
Harunori Ushikawa
Also filed as: USHIKAWA HARUNORI
20 granted patents·4 pending applications·855 citations·filing 1991–2012
95Inventor score
Top patents by PatentIndex Score
24 records- 0197US5775889AHeat treatment process for preventing slips in semiconductor wafersTOKYO ELECTRON LTD·Filed 1995·Granted Jul 7, 1998·395 cites·3 claims
- 0285US5378283ATreating deviceTOKYO ELECTRON LTD·Filed 1993·Granted Jan 3, 1995·96 cites·9 claims
- 0385US5310339AHeat treatment apparatus having a wafer boatTOKYO ELECTRON LTD·Filed 1993·Granted May 10, 1994·96 cites·17 claims
- 0484US5904872AHeating device, method of manufacturing the same, and processing apparatus using the sameTOKYO ELECTRON LTD·Filed 1995·Granted May 18, 1999·72 cites·44 claims
- 0578US5536320AProcessing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jul 16, 1996·30 cites·14 claims
- 0674US8377207B2Purge gas assemblyULVAC INC·Filed 2008·Granted Feb 19, 2013·5 cites·7 claims
- 0773US6551896B2Capacitor for analog circuit, and manufacturing method thereofTOKYO ELECTRON LTD·Filed 2000·Granted Apr 22, 2003·16 cites·17 claims
- 0867US6007633ASingle-substrate-processing apparatus in semiconductor processing systemTOKYO ELECTRON LTD·Filed 1998·Granted Dec 28, 1999·29 cites·20 claims
- 0965US6140256AMethod and device for treating semiconductor with treating gas while substrate is heatedTOKYO ELECTRON LTD·Filed 1996·Granted Oct 31, 2000·28 cites·14 claims
- 1064US5116784AMethod of forming semiconductor filmTOKYO ELECTRON LTD·Filed 1991·Granted May 26, 1992·38 cites·12 claims
- 1163US8669191B2Method for forming Ni filmUEHIGASHI TOSHIMITSU·Filed 2012·Granted Mar 11, 2014·2 cites·11 claims
- 1262US8158197B2Method for forming tantalum nitride filmGONOHE NARISHI·Filed 2006·Granted Apr 17, 2012·2 cites·9 claims
- 1357US5225378AMethod of forming a phosphorus doped silicon filmTOKYO ELECTRON LTD·Filed 1991·Granted Jul 6, 1993·28 cites·18 claims
- 1452US5984607ATransfer apparatus, transfer method, treatment apparatus and treatment methodTOKYO ELECTRON LTD·Filed 1996·Granted Nov 16, 1999·18 cites·22 claims
- 1548US8105468B2Method for forming tantalum nitride filmGONOHE NARISHI·Filed 2006·Granted Jan 31, 2012·0 cites·13 claims
- 1648US2011318505A1Method for forming tantalum nitride film and film-forming apparatus for forming the sameYAMAMOTO AKIKO·Filed 2009·Application pending·0 cites
- 1741US8476161B2Method for forming Cu electrical interconnection filmKUMAMOTO SHOICHIRO·Filed 2009·Granted Jul 2, 2013·0 cites·10 claims
- 1839US8796142B2Method for forming tantalum nitride filmGONOHE NARISHI·Filed 2006·Granted Aug 5, 2014·0 cites·7 claims
- 1939US8158198B2Method for forming tantalum nitride filmGONOHE NARISHI·Filed 2006·Granted Apr 17, 2012·0 cites·13 claims
- 2038US2009078580A1Method for Forming Cu FilmULVAC INC·Filed 2006·Application pending·0 cites
- 2138US2009162565A1Method for Forming Tantalum Nitride FilmGONOHE NARISHI·Filed 2006·Application pending·0 cites
- 2238US2008199601A1Method for Forming Tantalum Nitride FilmGONOHE NARISHI·Filed 2006·Application pending·0 cites
- 2337US8809193B2Method for the formation of Co film and method for the formation of Cu interconnection filmKUMAMOTO SHOICHIRO·Filed 2010·Granted Aug 19, 2014·0 cites·35 claims
- 2435US8815737B2Method for forming NiSi film, method for forming silicide film, method for forming metal film for use in silicide-annealing, apparatus for vacuum processing and film-forming apparatusHIGUCHI YASUSHI·Filed 2012·Granted Aug 26, 2014·0 cites·7 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →