Inventor · disambiguated record
Candace A. Sullivan
Also filed as: SULLIVAN CANDACE A · SULLIVAN CANDACE ANNE
13 granted patents·124 citations·filing 1995–2013
91Inventor score
Top patents by PatentIndex Score
13 records- 0165US6280527B1Aqueous quaternary ammonium hydroxide as a screening mask cleanerIBM·Filed 1998·Granted Aug 28, 2001·27 cites·26 claims
- 0262US5916374AOptimized in-line mask cleaning systemIBM·Filed 1998·Granted Jun 29, 1999·24 cites·17 claims
- 0357US6032683ASystem for cleaning residual paste from a maskIBM·Filed 1999·Granted Mar 7, 2000·19 cites·8 claims
- 0456US8486814B2Wafer backside defectivity clean-up utilizing selective removal of substrate materialCLARK JENNIFER C·Filed 2011·Granted Jul 16, 2013·1 cites·4 claims
- 0552US8835289B2Wafer backside defectivity clean-up utilizing selective removal of substrate materialIBM·Filed 2013·Granted Sep 16, 2014·0 cites·12 claims
- 0650US6351871B1Aqueous quaternary ammonium hydroxide as a screening mask cleanerIBM·Filed 1999·Granted Mar 5, 2002·14 cites·20 claims
- 0745US5800761AMethod of making an interface layer for stacked lamination sizing and sinteringIBM·Filed 1996·Granted Sep 1, 1998·10 cites·14 claims
- 0844US5759669AApparatus and method for screening green sheet with via hole using porous backing materialIBM·Filed 1995·Granted Jun 2, 1998·14 cites·19 claims
- 0938US6177184B1Method of making an interface layer for stacked lamination sizing and sinteringIBM·Filed 1998·Granted Jan 23, 2001·6 cites·12 claims
- 1032US5891543AApparatus and method for screening using electrostatic adhesionIBM·Filed 1996·Granted Apr 6, 1999·3 cites·12 claims
- 1132US5635000AMethod for screening using electrostatic adhesionIBM·Filed 1995·Granted Jun 3, 1997·3 cites·7 claims
- 1231US8629063B2Forming features on a substrate having varying feature densitiesDEGRAW DANIELLE L·Filed 2011·Granted Jan 14, 2014·0 cites·18 claims
- 1331US5866470AMethod of using an interface layer for stacked lamination sizing and sinteringIBM·Filed 1996·Granted Feb 2, 1999·3 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →