Inventor · disambiguated record
Richard Versluis
Also filed as: VERSLUIS RICHARD
6 granted patents·32 citations·filing 2006–2017
77Inventor score
Top patents by PatentIndex Score
6 records- 0190US8382301B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2009·Granted Feb 26, 2013·18 cites·34 claims
- 0287US8585224B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2013·Granted Nov 19, 2013·11 cites·34 claims
- 0364US11194659B2Method for executing a quantum error correction cycle in a quantum computerTNO·Filed 2017·Granted Dec 7, 2021·2 cites·17 claims
- 0455US7963144B2Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing systemASML NETHERLANDS BV·Filed 2009·Granted Jun 21, 2011·0 cites·7 claims
- 0550US7624617B2Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing systemASML NETHERLANDS BV·Filed 2006·Granted Dec 1, 2009·0 cites·7 claims
- 0643US9176398B2Method and system for thermally conditioning an optical elementSCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS·Filed 2009·Granted Nov 3, 2015·1 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →