Inventor · disambiguated record
Hirotoshi Nakanishi
Also filed as: NAKANISHI HIROTOSHI
23 granted patents·3 pending applications·243 citations·filing 1974–2007
96Inventor score
Top patents by PatentIndex Score
26 records- 0188US5407779APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted Apr 18, 1995·61 cites·8 claims
- 0275US5436107APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1992·Granted Jul 25, 1995·12 cites·8 claims
- 0367US5059507APositive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resinSUMITOMO CHEMICAL CO·Filed 1989·Granted Oct 22, 1991·18 cites·20 claims
- 0467US4500721AProcess for producing benzaldehydesSUMITOMO CHEMICAL CO·Filed 1983·Granted Feb 19, 1985·18 cites·11 claims
- 0559US5080997AProcess for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixtureSUMITOMO CHEMICAL CO·Filed 1989·Granted Jan 14, 1992·13 cites·22 claims
- 0656US5290657APositive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compoundSUMITOMO CHEMICAL CO·Filed 1990·Granted Mar 1, 1994·11 cites·5 claims
- 0755US5407778APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted Apr 18, 1995·12 cites·11 claims
- 0854US5290656AResist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compoundSUMITOMO CHEMICAL CO·Filed 1993·Granted Mar 1, 1994·12 cites·10 claims
- 0953US5283155APositive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivativeSUMITOMO CHEMICAL CO·Filed 1991·Granted Feb 1, 1994·11 cites·10 claims
- 1052US5378586AResist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete esterSUMITOMO CHEMICAL CO·Filed 1993·Granted Jan 3, 1995·11 cites·14 claims
- 1151US5556995AProcess for the preparation of polyhydric phenol compoundsSUMITOMO CHEMICAL CO·Filed 1995·Granted Sep 17, 1996·4 cites·13 claims
- 1248US5124228APositive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid esterSUMITOMO CHEMICAL CO·Filed 1989·Granted Jun 23, 1992·8 cites·15 claims
- 1347US5374742APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted Dec 20, 1994·6 cites·5 claims
- 1447US3956385AProcess for producing sulfonylamidesSUMITOMO CHEMICAL CO·Filed 1974·Granted May 11, 1976·4 cites·10 claims
- 1546US7220532B2Chemical amplification type resist compositionSUMITOMO CHEMICAL CO·Filed 2003·Granted May 22, 2007·7 cites·15 claims
- 1646US4220592ASynthesis of substituted phenylacetic acidSUMITOMO CHEMICAL CO·Filed 1978·Granted Sep 2, 1980·3 cites·7 claims
- 1745US5362598AQuinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dyeSUMITOMO CHEMICAL CO·Filed 1993·Granted Nov 8, 1994·7 cites·13 claims
- 1845US2010089439A1Cbp compoundUETANI YASUNORI·Filed 2007·Application pending·0 cites
- 1943US5275910APositive radiation-sensitive resist compositionSUMITOMO CHEMICAL CO·Filed 1992·Granted Jan 4, 1994·8 cites·8 claims
- 2043US2009039765A1Light emitting polymer composition and polymer light emitting deviceUETANI YASUNORI·Filed 2005·Application pending·0 cites
- 2142US5283324AProcess for preparing radiation sensitive compound and positive resist compositionSUMITOMO CHEMICAL CO·Filed 1992·Granted Feb 1, 1994·6 cites·11 claims
- 2240US2007020479A1Luminescent-polymer compositionUETANI YASUNORI·Filed 2004·Application pending·0 cites
- 2339US5587492APolyhydric phenol compound and positive resist composition comprising the sameSUMITOMO CHEMICAL CO·Filed 1995·Granted Dec 24, 1996·4 cites·3 claims
- 2437US5413895APositive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound.SUMITOMO CHEMICAL CO·Filed 1992·Granted May 9, 1995·4 cites·9 claims
- 2534US5714620APolyhydric phenol compound and positive resist composition comprising the sameSUMITOMO CHEMICAL CO·Filed 1996·Granted Feb 3, 1998·0 cites·5 claims
- 2629US5591871ABislactone compound and a process for producing the sameSUMITOMO CHEMICAL CO·Filed 1995·Granted Jan 7, 1997·3 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →