Inventor · disambiguated record
Chiu-Hsien Yeh
Also filed as: YEH CHIU-HSIEN
24 granted patents·3 pending applications·72 citations·filing 2006–2018
94Inventor score
Top patents by PatentIndex Score
27 records- 0186US8426284B2Manufacturing method for semiconductor structureYEH CHIU-HSIEN·Filed 2011·Granted Apr 23, 2013·8 cites·19 claims
- 0283US10151048B1Manufacturing method of epitaxial contact structure in semiconductor memory deviceUNITED MICROELECTRONICS CORP·Filed 2017·Granted Dec 11, 2018·5 cites·20 claims
- 0382US8232154B2Method for fabricating semiconductor deviceCHIEN CHIN-CHENG·Filed 2009·Granted Jul 31, 2012·9 cites·13 claims
- 0481US9899491B2Semiconductor device and method of forming the sameUNITED MICROELECTRONICS CORP·Filed 2016·Granted Feb 20, 2018·3 cites·5 claims
- 0581US9685383B2Method of forming semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2015·Granted Jun 20, 2017·4 cites·16 claims
- 0681US8552503B2Strained silicon structureHWANG GUANG-YAW·Filed 2010·Granted Oct 8, 2013·6 cites·12 claims
- 0781US8329547B2Semiconductor process for etching a recess into a substrate by using an etchant that contains hydrogen peroxideWU CHUN-YUAN·Filed 2010·Granted Dec 11, 2012·5 cites·17 claims
- 0879US9281201B2Method of manufacturing semiconductor device having metal gateUNITED MICROELECTRONICS CORP·Filed 2013·Granted Mar 8, 2016·4 cites·19 claims
- 0978US8987096B2Semiconductor processCHEN YING-TSUNG·Filed 2012·Granted Mar 24, 2015·5 cites·15 claims
- 1078US8405155B2Semiconductor structure with gate structure, source/drain region and recess filling with epitaxial layerYEH CHIU-HSIEN·Filed 2010·Granted Mar 26, 2013·5 cites·12 claims
- 1176US10026827B2Method for fabricating semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2016·Granted Jul 17, 2018·2 cites·14 claims
- 1275US10290736B2Semiconductor device and method of forming the sameUNITED MICROELECTRONICS CORP·Filed 2018·Granted May 14, 2019·2 cites·20 claims
- 1371US8551876B2Manufacturing method for semiconductor device having metal gateWANG YU-REN·Filed 2011·Granted Oct 8, 2013·5 cites·15 claims
- 1468US8980753B2Metal gate transistor and method for fabricating the sameWANG YENG-PENG·Filed 2010·Granted Mar 17, 2015·4 cites·11 claims
- 1563US8981527B2Resistor and manufacturing method thereofYANG JIE-NING·Filed 2011·Granted Mar 17, 2015·2 cites·8 claims
- 1662US9312258B2Strained silicon structureUNITED MICROELECTRONICS CORP·Filed 2013·Granted Apr 12, 2016·1 cites·18 claims
- 1761US8551847B2Method for forming metal gateWU CHUN-YUAN·Filed 2011·Granted Oct 8, 2013·1 cites·21 claims
- 1859US8211801B2Method of fabricating complementary metal-oxide-semiconductor (CMOS) deviceYEH CHIU-HSIEN·Filed 2010·Granted Jul 3, 2012·1 cites·15 claims
- 1952US8252515B2Method for removing photoresistCHIEN CHIN-CHENG·Filed 2009·Granted Aug 28, 2012·0 cites·13 claims
- 2051US10043882B2Method of forming semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2018·Granted Aug 7, 2018·0 cites·5 claims
- 2147US8404591B2Method of fabricating complementary metal-oxide-semiconductor (CMOS) deviceYEH CHIU-HSIEN·Filed 2012·Granted Mar 26, 2013·0 cites·20 claims
- 2241US10157744B2Method for forming patterns of semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2018·Granted Dec 18, 2018·0 cites·11 claims
- 2341US2007218694A1Method of reducing particle count inside a furnace and method of operating the furnaceHUNG CHENG-CHUNG·Filed 2006·Application pending·0 cites
- 2438US8298950B2Method of etching sacrificial layerYANG CHAN-LON·Filed 2010·Granted Oct 30, 2012·0 cites·14 claims
- 2537US2013012012A1Semiconductor processLIN CHIEN-LIANG·Filed 2011·Application pending·0 cites
- 2636US9000568B2Semiconductor structure and fabrication method thereofLAI SZU-HAO·Filed 2011·Granted Apr 7, 2015·0 cites·12 claims
- 2730US2012306028A1Semiconductor process and structure thereofWANG YU-REN·Filed 2011·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Chiu-Hsien Yeh files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →