Inventor · disambiguated record
Hironori Satoh
Also filed as: SATOH HIRONORI
13 granted patents·9 pending applications·92 citations·filing 1999–2025
90Inventor score
Top patents by PatentIndex Score
22 records- 0186US10416563B2Resist underlayer film composition, patterning process, and method for forming resist underlayer filmSHINETSU CHEMICAL CO·Filed 2018·Granted Sep 17, 2019·4 cites·21 claims
- 0274US8889264B2Hot dip plated high strength steel sheet for press forming use superior in low temperature toughnessSATOH HIRONORI·Filed 2008·Granted Nov 18, 2014·3 cites·4 claims
- 0366US7074193B2Pulse wave analysis apparatus and pulse wave analysis program product for automatically extracting characteristic points of pulse waveOMRON HEALTHCARE CO LTD·Filed 2005·Granted Jul 11, 2006·7 cites·22 claims
- 0464US7112174B2Pulse wave detection device and method of detecting pulse wave, wherein pulse wave is detected with selection of pressure sensor for pulse wave detection from plurality of pressure sensorsOMRON HEALTHCARE CO LTD·Filed 2005·Granted Sep 26, 2006·4 cites·10 claims
- 0563US2024402606A1Composition For Forming Resist Underlayer Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0662US7510530B2Pulse wave measuring apparatusOMRON HEALTHCARE CO LTD·Filed 2004·Granted Mar 31, 2009·28 cites·5 claims
- 0761US2023152695A1Resist underlayer film material, patterning process, and method for forming resist underlayer filmSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0861US2023168585A1Resist underlayer film material, patterning process, and method for forming resist underlayer filmSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0959US12379661B2Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic filmSHINETSU CHEMICAL CO·Filed 2021·Granted Aug 5, 2025·0 cites·23 claims
- 1059US6364967B1High-strength, high-toughness rolled shape steel and method of producing the sameNIPPON STEEL CORP·Filed 1999·Granted Apr 2, 2002·11 cites·6 claims
- 1158US7291113B2Pulse wave measuring apparatus that can calculate early systolic component and late systolic component properly from original waveformOMRON HEALTHCARE CO LTD·Filed 2004·Granted Nov 6, 2007·21 cites·16 claims
- 1257US2025004378A1Pattern Forming MethodSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1357US2024153771A1Composition For Forming Metal Oxide Film, Patterning Process, And Method For Forming Metal Oxide FilmSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1456US2025129209A1Composition For Forming Resist Underlayer Film, Resist Underlayer Film, Method For Manufacturing Resist Underlayer Film, Patterning Process, And Method For Manufacturing Semiconductor DeviceSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1556US2025123565A1Composition for forming resist underlayer film, resist underlayer film, method for manufacturing resist underlayer film, patterning process, and method for manufacturing semiconductor deviceSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1653US12032293B2Composition for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 9, 2024·0 cites·17 claims
- 1753US6258181B1Structural steel excellent in wear resistance and fatigue resistance property and method of producing the sameNIPPON STEEL CORP·Filed 1999·Granted Jul 10, 2001·11 cites·24 claims
- 1853US2025266263A1Method For Forming Organic Film And Method For Manufacturing Substrate For Semiconductor DeviceSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1952US11675268B2Composition for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Jun 13, 2023·0 cites·19 claims
- 2048US7229414B2Pulse wave measuring apparatus that can obtain optimum pressurization force of pressure sensorOMRON HEALTHCARE CO LTD·Filed 2004·Granted Jun 12, 2007·3 cites·10 claims
- 2145US11614686B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Mar 28, 2023·0 cites·10 claims
- 2240US2005283087A1Device and method for central blood pressure estimationOMRON HEALTHCARE CO LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →