Inventor · disambiguated record
Jen-Chieh Shih
Also filed as: SHIH JEN-CHIEH
26 granted patents·11 pending applications·129 citations·filing 2003–2024
95Inventor score
Top patents by PatentIndex Score
37 records- 0195US8460856B2Material and method for photolithographyYEH HSIAO-WEI·Filed 2011·Granted Jun 11, 2013·35 cites·18 claims
- 0283US6900134B1Method for forming openings in a substrate using bottom antireflective coatingsTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted May 31, 2005·28 cites·21 claims
- 0380US7517639B2Seal ring arrangements for immersion lithography systemsTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Apr 14, 2009·4 cites·34 claims
- 0477US7642184B2Method for dual damascene processTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jan 5, 2010·7 cites·20 claims
- 0573US7452822B2Via plug formation in dual damascene processTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Nov 18, 2008·6 cites·23 claims
- 0672US7180572B2Immersion optical projection systemTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Feb 20, 2007·11 cites·36 claims
- 0770US11287846B2Head-mounted displaySTARVR CORP·Filed 2019·Granted Mar 29, 2022·1 cites·20 claims
- 0869US7948096B2Semiconductor using specific contact angle for immersion lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted May 24, 2011·2 cites·16 claims
- 0968US8039195B2Si device making method by using a novel material for packing and unpacking processTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Oct 18, 2011·4 cites·17 claims
- 1068US7501226B2Immersion lithography system with wafer sealing mechanismsTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Mar 10, 2009·11 cites·22 claims
- 1165US7972957B2Method of making openings in a layer of a semiconductor deviceTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jul 5, 2011·2 cites·15 claims
- 1264USD932664SLED lightSHIH JEN CHIEH·Filed 2020·Granted Oct 5, 2021·3 cites·1 claims
- 1364USD932666SLED lightSHIH JEN CHIEH·Filed 2020·Granted Oct 5, 2021·3 cites·1 claims
- 1463US7238624B2System and method for manufacturing semiconductor devices using a vacuum chamberTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jul 3, 2007·1 cites·29 claims
- 1561US7119035B2Method using specific contact angle for immersion lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Oct 10, 2006·5 cites·11 claims
- 1658US7924401B2Seal ring arrangements for immersion lithography systemsTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Apr 12, 2011·0 cites·17 claims
- 1753US8563198B2Device and method for providing wavelength reduction with a photomaskLIN BURN JENG·Filed 2011·Granted Oct 22, 2013·0 cites·21 claims
- 1853US8029969B2Material and method for photolithographyTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Oct 4, 2011·0 cites·19 claims
- 1953US7135259B2Scatterometric method of monitoring hot plate temperature and facilitating critical dimension controlTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Nov 14, 2006·4 cites·20 claims
- 2053US2025126760A1Cooling systemPEGATRON CORP·Filed 2024·Application pending·0 cites
- 2153US2025126759A1Cooling device and cooling systemPEGATRON CORP·Filed 2024·Application pending·0 cites
- 2249USD932665SLED lightSHIH JEN CHIEH·Filed 2020·Granted Oct 5, 2021·1 cites·1 claims
- 2348US7777184B2Method for photoresist characterization and analysisTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Aug 17, 2010·0 cites·23 claims
- 2447US7751025B2Scatterometric method of monitoring hot plate temperature and facilitating critical dimension controlTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jul 6, 2010·0 cites·19 claims
- 2545US10690291B1LED bulbSHIH JEN CHIEH·Filed 2019·Granted Jun 23, 2020·0 cites·15 claims
- 2644US7667821B2Multi-focus scanning with a tilted mask or waferTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Feb 23, 2010·0 cites·21 claims
- 2744US2005100798A1Device and method for providing wavelength reduction with a photomaskTAIWAN SEMICONDUCTOR MFG·Filed 2004·Application pending·0 cites
- 2841US2006292501A1Lithography process with an enhanced depth-on-focusTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
- 2940US2006145355A1Plug filling without step-height difference for dual damascene processTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
- 3040US2006199111A1Method for manufacturing semiconductor devices using a photo acid generatorTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
- 3140US2006228894A1Method for semiconductor manufacturing using a negative photoresist with thermal flow propertiesTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
- 3240US2006083997A1Photomask with wavelength reduction material and pellicleTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
- 3339US7279793B2System and method for manufacturing semiconductor devices using an anti-reflective coating layerTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Oct 9, 2007·0 cites·13 claims
- 3439US2006223309A1Dual-damascene process for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
- 3538US2005181313A1Method for forming openings in a substrate using a packing and unpacking processFiled 2004·Application pending·0 cites
- 3636USD935914SPositioning trackerACER INC·Filed 2019·Granted Nov 16, 2021·1 cites·1 claims
- 3735US2019048293A1Cleaning solution and cleaning method for a semiconductor substrate or deviceTOKYO OHKA KOGYO CO LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →