Inventor · disambiguated record
Keiki Ito
Also filed as: ITO KEIKI
8 granted patents·1 pending application·172 citations·filing 1995–2016
87Inventor score
Top patents by PatentIndex Score
9 records- 0195US7353841B2Relative pressure control system and relative flow control systemCKD CORP·Filed 2005·Granted Apr 8, 2008·101 cites·14 claims
- 0294US9441791B2Gas supply unit, substrate processing apparatus and supply gas setting methodTOKYO ELECTRON LTD·Filed 2012·Granted Sep 13, 2016·21 cites·12 claims
- 0377US8906193B2Gas supply unit, substrate processing apparatus and supply gas setting methodMIZUSAWA KENETSU·Filed 2009·Granted Dec 9, 2014·5 cites·4 claims
- 0468US7481240B2Partial pressure control system, flow rate control system and shower plate used for partial pressure control systemTOKYO ELECTRON LTD·Filed 2004·Granted Jan 27, 2009·10 cites·7 claims
- 0566US10056230B2Power supply system, plasma processing apparatus and power supply control methodTOKYO ELECTRON LTD·Filed 2016·Granted Aug 21, 2018·1 cites·9 claims
- 0666US8109288B2Flow rate control system and shower plate used for partial pressure control systemNAGAOKA HIDEKI·Filed 2008·Granted Feb 7, 2012·3 cites·15 claims
- 0761US10074519B2Plasma processing apparatus and filter unitTOKYO ELECTRON LTD·Filed 2013·Granted Sep 11, 2018·1 cites·18 claims
- 0861US5554249AMagnetron plasma processing systemTOKYO ELECTRON LTD·Filed 1995·Granted Sep 10, 1996·30 cites·20 claims
- 0949US2006124169A1Gas supply unit, substrate processing apparatus, and supply gas setting methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →