Inventor · disambiguated record
Chang-Wook Moon
Also filed as: MOON CHANG-WOOK
22 granted patents·6 pending applications·199 citations·filing 2000–2014
94Inventor score
Top patents by PatentIndex Score
28 records- 0197US7417271B2Electrode structure having at least two oxide layers and non-volatile memory device having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Aug 26, 2008·97 cites·19 claims
- 0292US9318573B2Field effect transistor having germanium nanorod and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Apr 19, 2016·15 cites·13 claims
- 0387US6333630B1Magnetic field generating apparatus for magnetic resonance imaging systemSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Dec 25, 2001·47 cites·10 claims
- 0477US9536881B2Semiconductor devices having fin shaped channelsMAEDA SHIGENOBU·Filed 2014·Granted Jan 3, 2017·4 cites·10 claims
- 0572US6835919B2Inductively coupled plasma systemSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 28, 2004·12 cites·22 claims
- 0668US7189981B2Electromagnetic focusing method for electron-beam lithography systemSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Mar 13, 2007·3 cites·13 claims
- 0766US8232613B2Germanium silicide layer including vanadium, platinum, and nickelMOON CHANG-WOOK·Filed 2010·Granted Jul 31, 2012·2 cites·7 claims
- 0864US8125021B2Non-volatile memory devices including variable resistance materialCHO CHOONG-RAE·Filed 2007·Granted Feb 28, 2012·3 cites·5 claims
- 0959US2007194367A1Storage node, nonvolatile memory device, methods of fabricating the same and method of operating the nonvolatile memory deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1058US6815681B2Electron beam lithography apparatus using a patterned emitterSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Nov 9, 2004·3 cites·30 claims
- 1158US6784438B2Electron projection lithography apparatus using secondary electronsSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Aug 31, 2004·3 cites·9 claims
- 1256US6870173B2Electron-beam focusing apparatus and electron-beam projection lithography system employing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Mar 22, 2005·4 cites·24 claims
- 1352US2007278425A1Method of operating emitter for electron-beam projection lithography systemSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1451US7863142B2Method of forming a germanium silicide layer, semiconductor device including the germanium silicide layer, and method of manufacturing the semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Jan 4, 2011·0 cites·17 claims
- 1551US7859035B2Storage node having a metal-insulator-metal structure, non-volatile memory device including a storage node having a metal-insulator-metal structure and method of operating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Dec 28, 2010·0 cites·15 claims
- 1650US7095036B2Electron beam lithography apparatus using a patterned emitter and method of fabricating the patterned emitterSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Aug 22, 2006·2 cites·27 claims
- 1750US7091054B2Manufacturing method for emitter for electron-beam projection lithographySAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Aug 15, 2006·0 cites·15 claims
- 1850US6953946B2Emitter for electron-beam projection lithography system and manufacturing method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Oct 11, 2005·2 cites·12 claims
- 1948US8193030B2Methods of fabricating non-volatile memory devices having carbon nanotube layer and passivation layerMOON CHANG-WOOK·Filed 2011·Granted Jun 5, 2012·1 cites·10 claims
- 2048US7646003B2Focusing apparatus and lithography system using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jan 12, 2010·0 cites·32 claims
- 2148US2007138940A1Surface electron emission device and display device having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2248US2008272366A1Field effect transistor having germanium nanorod and method of manufacturing the sameMOON CHANG-WOOK·Filed 2008·Application pending·0 cites
- 2346US8455854B2Nonvolatile memory device including amorphous alloy metal oxide layer and method of manufacturing the sameCHO CHOONG-RAE·Filed 2007·Granted Jun 4, 2013·0 cites·10 claims
- 2446US2006181220A1Apparatus and method of fabricating emitter using arcSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 2545US7256406B2Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitterSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Aug 14, 2007·0 cites·16 claims
- 2642US7884410B2Nonvolatile memory devices and methods of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Feb 8, 2011·1 cites·10 claims
- 2742US7667481B2Surface electron emission device array and thin film transistor inspection system using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Feb 23, 2010·0 cites·22 claims
- 2840US2008164533A1Method of manufacturing a germanosilicide and a semiconductor device having the germanosilicideSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
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