Inventor · disambiguated record
Jiro Hata
Also filed as: HATA JIRO
17 granted patents·1,946 citations·filing 1993–2003
96Inventor score
Files withTOKYO ELECTRON LTD17
Top patents by PatentIndex Score
17 records- 0198US5571366APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Nov 5, 1996·502 cites·21 claims
- 0297US5522934APlasma processing apparatus using vertical gas inlets one on top of anotherTOKYO ELECTRON LTD·Filed 1995·Granted Jun 4, 1996·322 cites·14 claims
- 0395US5413958AMethod for manufacturing a liquid crystal display substrateTOKYO ELECTRON LTD·Filed 1993·Granted May 9, 1995·208 cites·10 claims
- 0494US5525159APlasma process apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jun 11, 1996·194 cites·22 claims
- 0593US5372836AMethod of forming polycrystalling silicon film in process of manufacturing LCDTOKYO ELECTRON LTD·Filed 1993·Granted Dec 13, 1994·163 cites·15 claims
- 0692US5531834APlasma film forming method and apparatus and plasma processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jul 2, 1996·161 cites·10 claims
- 0792US5529630AApparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystalsTOKYO ELECTRON LTD·Filed 1995·Granted Jun 25, 1996·122 cites·1 claims
- 0890US5792261APlasma process apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Aug 11, 1998·94 cites·16 claims
- 0990US5476182AEtching apparatus and method thereforTOKYO ELECTRON LTD·Filed 1993·Granted Dec 19, 1995·66 cites·32 claims
- 1084US6350347B1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Feb 26, 2002·14 cites·12 claims
- 1179US6136139APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Oct 24, 2000·22 cites·15 claims
- 1272USRE39020EPlasma process apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Mar 21, 2006·12 cites·106 claims
- 1362US6136140APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Oct 24, 2000·15 cites·23 claims
- 1460USRE36371EMethod of forming polycrystalline silicon film in process of manufacturing LCDTOKYO ELECTRON LTD·Filed 1996·Granted Nov 2, 1999·22 cites·17 claims
- 1554US5938883APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Aug 17, 1999·16 cites·13 claims
- 1651USRE40963EMethod for plasma processing by shaping an induced electric fieldTOKYO ELECTRON LTD·Filed 2003·Granted Nov 10, 2009·1 cites·18 claims
- 1749US6265031B1Method for plasma processing by shaping an induced electric fieldTOKYO ELECTRON LTD·Filed 1999·Granted Jul 24, 2001·12 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →