Inventor · disambiguated record
Tae Seung Cho
Also filed as: CHO TAE · CHO TAE S · CHO TAE-SEUNG
21 granted patents·23 pending applications·598 citations·filing 2006–2023
94Inventor score
Top patents by PatentIndex Score
44 records- 0198US9773648B2Dual discharge modes operation for remote plasmaAPPLIED MATERIALS INC·Filed 2014·Granted Sep 26, 2017·114 cites·20 claims
- 0298US9728437B2High temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2015·Granted Aug 8, 2017·123 cites·14 claims
- 0398US9117855B2Polarity control for remote plasmaAPPLIED MATERIALS INC·Filed 2014·Granted Aug 25, 2015·184 cites·15 claims
- 0497US9659753B2Grooved insulator to reduce leakage currentAPPLIED MATERIALS INC·Filed 2014·Granted May 23, 2017·123 cites·12 claims
- 0594US10319649B2Optical emission spectroscopy (OES) for remote plasma monitoringAPPLIED MATERIALS INC·Filed 2017·Granted Jun 11, 2019·8 cites·18 claims
- 0693US11594428B2Low temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2017·Granted Feb 28, 2023·9 cites·16 claims
- 0792US10167556B2Apparatus and method for depositing a coating on a substrate at atmospheric pressureUNIV ILLINOIS·Filed 2015·Granted Jan 1, 2019·24 cites·15 claims
- 0889US11361941B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2020·Granted Jun 14, 2022·2 cites·17 claims
- 0986US11373845B2Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processesAPPLIED MATERIALS INC·Filed 2020·Granted Jun 28, 2022·2 cites·17 claims
- 1082US11915911B2Two piece electrode assembly with gap for plasma controlAPPLIED MATERIALS INC·Filed 2020·Granted Feb 27, 2024·1 cites·20 claims
- 1182US10593560B2Magnetic induction plasma source for semiconductor processes and equipmentAPPLIED MATERIALS INC·Filed 2018·Granted Mar 17, 2020·3 cites·20 claims
- 1278US9874524B2In-situ spatially resolved plasma monitoring by using optical emission spectroscopyAPPLIED MATERIALS INC·Filed 2016·Granted Jan 23, 2018·2 cites·19 claims
- 1377US12009228B2Low temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2023·Granted Jun 11, 2024·0 cites·19 claims
- 1474US10699879B2Two piece electrode assembly with gap for plasma controlAPPLIED MATERIALS INC·Filed 2018·Granted Jun 30, 2020·1 cites·20 claims
- 1571US10752994B2Apparatus and method for depositing a coating on a substrate at atmospheric pressureUNIV ILLINOIS·Filed 2018·Granted Aug 25, 2020·1 cites·12 claims
- 1669US11901161B2Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processesAPPLIED MATERIALS INC·Filed 2022·Granted Feb 13, 2024·0 cites·20 claims
- 1767US9528185B2Plasma uniformity control by arrays of unit cell plasmasAPPLIED MATERIALS INC·Filed 2014·Granted Dec 27, 2016·1 cites·9 claims
- 1857US12002659B2Apparatus for generating etchants for remote plasma processesAPPLIED MATERIALS INC·Filed 2022·Granted Jun 4, 2024·0 cites·20 claims
- 1956US2019259580A1Optical emission spectroscopy (oes) for remote plasma monitoringAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2055US10468285B2High temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2017·Granted Nov 5, 2019·0 cites·19 claims
- 2151US2009179569A1Plasma display panel and manufacturing method of the sameCHO TAE-SEUNG·Filed 2008·Application pending·0 cites
- 2251US2008231185A1Electrode sheet for plasma display panel and plasma display panel using the sameCHO TAE-SEUNG·Filed 2008·Application pending·0 cites
- 2351US2008165093A1Plasma display panel and method of driving the sameCHO TAE-SEUNG·Filed 2007·Application pending·0 cites
- 2450US2008224589A1Plasma Display PanelCHO TAE-SEUNG·Filed 2008·Application pending·0 cites
- 2550US2009039783A1Display panelCHO TAE-SEUNG·Filed 2008·Application pending·0 cites
- 2650US2008218441A1Plasma display panelCHO TAE-SEUNG·Filed 2008·Application pending·0 cites
- 2749US2008116799A1Plasma display panelCHO TAE-SEUNG·Filed 2007·Application pending·0 cites
- 2849US2008111486A1Plasma display panelCHUN BYOUNG-MIN·Filed 2007·Application pending·0 cites
- 2949US2008158105A1Plasma display panel and method of manufacturing the sameSAMSUNG SDI CO LTD·Filed 2007·Application pending·0 cites
- 3049US2008231188A1Plasma display panel and method for manufacturing the sameCHOI JONG-WOO·Filed 2008·Application pending·0 cites
- 3149US2008246386A1Electrode sheet for plasma display panel and plasma display panel using the sameCHUN BYOUNG-MIN·Filed 2008·Application pending·0 cites
- 3249US2008238827A1Plasma display panel and method for manufacturing the sameCHOI JONG-WOO·Filed 2008·Application pending·0 cites
- 3349US2008211739A1Plasma display panelCHUN BYOUNG-MIN·Filed 2008·Application pending·0 cites
- 3448US7646150B2Plasma display panel and manufacturing method of the sameSAMSUNG SDI CO LTD·Filed 2007·Granted Jan 12, 2010·0 cites·20 claims
- 3548US2021005435A1Methods, apparatus, and systems for processing a substrateAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3648US2016225652A1Low temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3748US2008084154A1Plasma display panel and method of manufacturing the sameCHUN BYOUNG-MIN·Filed 2007·Application pending·0 cites
- 3843US10920320B2Plasma health determination in semiconductor substrate processing reactorsAPPLIED MATERIALS INC·Filed 2017·Granted Feb 16, 2021·0 cites·12 claims
- 3943US2008231187A1Plasma display panel and method of manufacturing the sameHWANG YONG-SHIK·Filed 2008·Application pending·0 cites
- 4042US2008042933A1Plasma display panelSHIN HYEA-WEON·Filed 2007·Application pending·0 cites
- 4140US2007132383A1Plasma display panelKIM JEONG-NAM·Filed 2006·Application pending·0 cites
- 4240US2020090907A1Systems and processes for plasma tuningAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4339US2007085479A1Plasma display panel (PDP) and its method of manufactureHWANG YONG-SHIK·Filed 2006·Application pending·0 cites
- 4432US2007063643A1Plasma display panelCHO TAE-SEUNG·Filed 2006·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →