Inventor · disambiguated record
Masahito Hiroshima
Also filed as: HIROSHIMA MASAHITO
9 granted patents·3 pending applications·103 citations·filing 1997–2016
86Inventor score
Top patents by PatentIndex Score
12 records- 0188US7714308B2Variable shaped electron beam lithography system and method for manufacturing substrateELPIDA MEMORY INC·Filed 2007·Granted May 11, 2010·13 cites·11 claims
- 0277US6022797AMethod of manufacturing through holes in a semiconductor deviceHITACHI LTD·Filed 1997·Granted Feb 8, 2000·62 cites·49 claims
- 0372US8124303B2Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuitHIROSHIMA MASAHITO·Filed 2009·Granted Feb 28, 2012·3 cites·8 claims
- 0466US7922960B2Fine resist pattern forming method and nanoimprint mold structureELPIDA MEMORY INC·Filed 2008·Granted Apr 12, 2011·9 cites·19 claims
- 0564US7208788B2Semiconductor device and manufacturing method thereofELPIDA MEMORY INC·Filed 2004·Granted Apr 24, 2007·9 cites·4 claims
- 0656US7438998B2Method of manufacturing semiconductor deviceELPIDA MEMORY INC·Filed 2004·Granted Oct 21, 2008·5 cites·6 claims
- 0754US10131135B2Imprint apparatus and imprint methodTOSHIBA MEMORY CORP·Filed 2016·Granted Nov 20, 2018·0 cites·6 claims
- 0850US8090188B2Apparatus including defect correcting system which repeats a correcting of a reticle pattern defect and a correcting method using the apparatusHIROSHIMA MASAHITO·Filed 2007·Granted Jan 3, 2012·2 cites·19 claims
- 0949US7776495B2Semiconductor device and manufacturing method thereofELPIDA MEMORY INC·Filed 2007·Granted Aug 17, 2010·0 cites·2 claims
- 1047US2012058421A1Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuitHIROSHIMA MASAHITO·Filed 2011·Application pending·0 cites
- 1145US2009092906A1Method of manufacturing phase shift photomaskELPIDA MEMORY INC·Filed 2008·Application pending·0 cites
- 1237US2005074679A1Method of manufacturing semiconductor deviceELPIDA MEMORY INC·Filed 2004·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →