Inventor · disambiguated record
Soon Yoeng Tan
Also filed as: TAN SOON YOENG
19 granted patents·49 citations·filing 2003–2016
91Inventor score
Files withGLOBALFOUNDRIES SG PTE LTD7CHARTERED SEMICONDUCTOR MFG5TAN SOON YOENG4GLOBALFOUNDRIES INC1NING GUO XIANG1
Top patents by PatentIndex Score
19 records- 0183US8533651B1Providing conversion of a planar design to a FinFET designTAN SOON YOENG·Filed 2012·Granted Sep 10, 2013·13 cites·20 claims
- 0280US8692380B2Integrated circuit system with sub-geometry removal and method of manufacture thereofGLOBALFOUNDRIES SG PTE LTD·Filed 2012·Granted Apr 8, 2014·3 cites·8 claims
- 0374US7655388B2Mask and method to pattern chromeless phase lithography contact holeCHARTERED SEMICONDUCTOR MFG·Filed 2005·Granted Feb 2, 2010·4 cites·36 claims
- 0473US7014962B2Half tone alternating phase shift masksCHARTERED SEMICONDUCTOR MFG·Filed 2003·Granted Mar 21, 2006·13 cites·57 claims
- 0572US8057968B2Mask and method to pattern chromeless phase lithography contact holeTAN SIA KIM·Filed 2010·Granted Nov 15, 2011·2 cites·25 claims
- 0668US8283193B2Integrated circuit system with sealring and method of manufacture thereofTAN SOON YOENG·Filed 2009·Granted Oct 9, 2012·4 cites·20 claims
- 0766US8293546B2Integrated circuit system with sub-geometry removal and method of manufacture thereofTAN SOON YOENG·Filed 2009·Granted Oct 23, 2012·2 cites·10 claims
- 0865US9341961B2Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniquesNING GUO XIANG·Filed 2013·Granted May 17, 2016·1 cites·7 claims
- 0958US7556891B2Method and apparatus for contact hole unit cell formationCHARTERED SEMICONDUCTOR MFG·Filed 2004·Granted Jul 7, 2009·5 cites·20 claims
- 1052US7923180B2Cross technology reticlesCHARTERED SEMICONDUCTOR MFG·Filed 2009·Granted Apr 12, 2011·0 cites·18 claims
- 1151US9798238B2Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniquesGLOBALFOUNDRIES SG PTE LTD·Filed 2016·Granted Oct 24, 2017·0 cites·5 claims
- 1249US9395621B2Pellicles and devices comprising a photomask and the pellicleGLOBALFOUNDRIES SG PTE LTD·Filed 2014·Granted Jul 19, 2016·0 cites·20 claims
- 1347US7288366B2Method for dual damascene patterning with single exposure using tri-tone phase shift maskCHARTERED SEMICONDUCTOR MFG·Filed 2003·Granted Oct 30, 2007·2 cites·9 claims
- 1445US9947645B2Multi-project wafer with IP protection by reticle mask pattern modificationGLOBALFOUNDRIES SG PTE LTD·Filed 2015·Granted Apr 17, 2018·0 cites·20 claims
- 1544US9136223B2Forming alignment mark and resulting markGLOBALFOUNDRIES INC·Filed 2013·Granted Sep 15, 2015·0 cites·17 claims
- 1644US9069923B2IP protectionTAN SOON YOENG·Filed 2011·Granted Jun 30, 2015·0 cites·19 claims
- 1739US8048588B2Method and apparatus for removing radiation side lobesGLOBALFOUNDRIES SG PTE LTD·Filed 2004·Granted Nov 1, 2011·0 cites·20 claims
- 1837US9336345B2Methods for converting planar designs to FinFET designs in the design and fabrication of integrated circuitsGLOBALFOUNDRIES SG PTE LTD·Filed 2013·Granted May 10, 2016·0 cites·19 claims
- 1934US9318399B2Semiconductor wafers employing a fixed-coordinate metrology scheme and methods for fabricating integrated circuits using the sameGLOBALFOUNDRIES SG PTE LTD·Filed 2013·Granted Apr 19, 2016·0 cites·17 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →