Inventor · disambiguated record
Christopher F. Bevis
Also filed as: BEVIS CHRISTOPHER · BEVIS CHRISTOPHER F
54 granted patents·7 pending applications·1,775 citations·filing 1992–2021
99Inventor score
Files withKLA TENCOR TECH CORP32KLA TENCOR CORP11KIRK MICHAEL D2KLA TENCOR TECHNOLOGIES2KOJIMA SHINICHI2
Top patents by PatentIndex Score
61 records- 0198US8010222B2Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or toolKLA TENCOR TECH CORP·Filed 2008·Granted Aug 30, 2011·29 cites·10 claims
- 0298US7873504B1Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layoutKLA TENCOR TECH CORP·Filed 2007·Granted Jan 18, 2011·60 cites·19 claims
- 0398US6886153B1Design driven inspection or measurement for semiconductor using recipeKLA TENCOR CORP·Filed 2001·Granted Apr 26, 2005·135 cites·23 claims
- 0497US11474016B1Hyper-spectral imaging of airborne biological particlesSCANIT TECH INC·Filed 2020·Granted Oct 18, 2022·5 cites·20 claims
- 0597US8692204B2Apparatus and methods for electron beam detectionKOJIMA SHINICHI·Filed 2012·Granted Apr 8, 2014·116 cites·20 claims
- 0697US7433040B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Oct 7, 2008·28 cites·18 claims
- 0797US7317531B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2003·Granted Jan 8, 2008·83 cites·30 claims
- 0897US7242477B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Jul 10, 2007·124 cites·20 claims
- 0997US5416594ASurface scanner with thin film gaugeTENCOR INSTRUMENTS·Filed 1993·Granted May 16, 1995·210 cites·24 claims
- 1096US7557921B1Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic toolsKLA TENCOR TECH CORP·Filed 2005·Granted Jul 7, 2009·55 cites·14 claims
- 1196US7068363B2Systems for inspection of patterned or unpatterned wafers and other specimenKLA TENCOR TECH CORP·Filed 2003·Granted Jun 27, 2006·206 cites·39 claims
- 1295US7933016B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2009·Granted Apr 26, 2011·15 cites·20 claims
- 1395US7663753B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Feb 16, 2010·19 cites·45 claims
- 1495US7199874B2Darkfield inspection system having a programmable light selection arrayKLA TENCOR TECH CORP·Filed 2005·Granted Apr 3, 2007·26 cites·14 claims
- 1594US7385699B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Jun 10, 2008·34 cites·33 claims
- 1694US7301634B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Nov 27, 2007·35 cites·33 claims
- 1793US7940386B1Scatterometry target employing non-periodic defect features to enhance or optimize target sensitivity to a parameter of interestKLA TENCOR CORP·Filed 2007·Granted May 10, 2011·21 cites·18 claims
- 1893US6866559B2Windows configurable to be coupled to a process tool or to be disposed within an opening in a polishing padKLA TENCOR TECHNOLOGIES·Filed 2003·Granted Mar 15, 2005·31 cites·90 claims
- 1992US8422010B2Methods and systems for determining a characteristic of a waferKIRK MICHAEL D·Filed 2012·Granted Apr 16, 2013·13 cites·34 claims
- 2092US7847937B1Optical measurment systems and methodsKLA TENCOR TECH CORP·Filed 2007·Granted Dec 7, 2010·19 cites·58 claims
- 2192US7760364B1Systems and methods for near-field heterodyne spectroscopyKLA TENCOR CORP·Filed 2008·Granted Jul 20, 2010·19 cites·36 claims
- 2292US7332438B2Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or toolKLA TENCOR TECH CORP·Filed 2006·Granted Feb 19, 2008·11 cites·9 claims
- 2392US7269816B2Driven inspection or measurementKLA TENCOR TECHNOLOGIES INC·Filed 2005·Granted Sep 11, 2007·14 cites·22 claims
- 2492US6884146B2Systems and methods for characterizing a polishing processKLA TENCOR TECH CORP·Filed 2003·Granted Apr 26, 2005·24 cites·39 claims
- 2590US7659126B1Electrical test method and apparatusKLA TENCOR TECH CORP·Filed 2007·Granted Feb 9, 2010·15 cites·21 claims
- 2690US5241366AThin film thickness monitorTENCOR INSTRUMENTS·Filed 1992·Granted Aug 31, 1993·79 cites·38 claims
- 2789US11183377B2Mass spectrometer detector and system and method using the sameNOVA MEASURING INSTR INC·Filed 2017·Granted Nov 23, 2021·6 cites·19 claims
- 2889US7002677B2Darkfield inspection system having a programmable light selection arrayKLA TENCOR TECH CORP·Filed 2003·Granted Feb 21, 2006·31 cites·42 claims
- 2988US7379183B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted May 27, 2008·18 cites·44 claims
- 3087US8933425B1Apparatus and methods for aberration correction in electron beam based systemBEVIS CHRISTOPHER F·Filed 2011·Granted Jan 13, 2015·10 cites·19 claims
- 3187US8284394B2Methods and systems for determining a characteristic of a waferKIRK MICHAEL D·Filed 2007·Granted Oct 9, 2012·12 cites·36 claims
- 3287US7106432B1Surface inspection system and method for using photo detector array to detect defects in inspection surfaceKLA TENCOR TECH CORP·Filed 2002·Granted Sep 12, 2006·35 cites·13 claims
- 3386US7361941B1Calibration standards and methodsKLA TENCOR TECH CORP·Filed 2004·Granted Apr 22, 2008·24 cites·29 claims
- 3486US6935922B2Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishingKLA TENCOR TECH CORP·Filed 2003·Granted Aug 30, 2005·16 cites·100 claims
- 3585US7381975B1In plane drift compensationKLA TENCOR CORP·Filed 2005·Granted Jun 3, 2008·9 cites·12 claims
- 3684US8831767B2Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or toolLEHMAN KURT·Filed 2011·Granted Sep 9, 2014·3 cites·19 claims
- 3784US7061598B1Darkfield inspection system having photodetector arrayKLA TENCOR TECH CORP·Filed 2002·Granted Jun 13, 2006·24 cites·9 claims
- 3884US7030018B2Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or toolKLA TENCOR TECH CORP·Filed 2003·Granted Apr 18, 2006·14 cites·23 claims
- 3984US7009696B2Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection toolKLA TENCOR CORP·Filed 2004·Granted Mar 7, 2006·19 cites·21 claims
- 4082US7808638B2Scatterometry target and methodKLA TENCOR CORP·Filed 2008·Granted Oct 5, 2010·7 cites·4 claims
- 4180US7355709B1Methods and systems for optical and non-optical measurements of a substrateKLA TENCOR TECH CORP·Filed 2005·Granted Apr 8, 2008·12 cites·19 claims
- 4280US7175503B2Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current deviceKLA TENCOR TECH CORP·Filed 2003·Granted Feb 13, 2007·11 cites·47 claims
- 4380US6414752B1Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection toolKLA TENCOR TECH CORP·Filed 1999·Granted Jul 2, 2002·34 cites·16 claims
- 4479US7052369B2Methods and systems for detecting a presence of blobs on a specimen during a polishing processKLA TENCOR TECH CORP·Filed 2003·Granted May 30, 2006·10 cites·38 claims
- 4575US6770868B1Critical dimension scanning electron microscopeKLA TENCOR TECH CORP·Filed 2003·Granted Aug 3, 2004·16 cites·23 claims
- 4672US11823883B2Mass spectrometer detector and system and method using the sameNOVA MEASURING INSTR INC·Filed 2021·Granted Nov 21, 2023·0 cites·7 claims
- 4768US7505619B2System and method for conducting adaptive fourier filtering to detect defects in dense logic areas of an inspection surfaceKLA TENCOR TECH CORP·Filed 2005·Granted Mar 17, 2009·2 cites·30 claims
- 4868US6770879B1Motion picture output from electron microscopeKLA TENCOR TECH CORP·Filed 2003·Granted Aug 3, 2004·10 cites·20 claims
- 4965US6686996B2Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection toolKLA TENCOR CORP·Filed 2002·Granted Feb 3, 2004·7 cites·40 claims
- 5061US9607802B2Apparatus and methods for aberration correction in electron beam based systemKLA TENCOR CORP·Filed 2014·Granted Mar 28, 2017·0 cites·18 claims
Showing the top 50 of 61 patent records by PatentIndex Score.
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