Inventor · disambiguated record
Stephen P. Deornellas
Also filed as: DEORNELLAS STEPHEN · DEORNELLAS STEPHEN P · DEORNELLAS STEPHEN PAUL
24 granted patents·2 pending applications·506 citations·filing 1995–2008
97Inventor score
Top patents by PatentIndex Score
26 records- 0193US6006694APlasma reactor with a deposition shieldTEGAL CORP·Filed 1998·Granted Dec 28, 1999·60 cites·2 claims
- 0287US6190496B1Plasma etch reactor and method for emerging filmsTEGAL CORP·Filed 1999·Granted Feb 20, 2001·68 cites·48 claims
- 0386US6354240B1Plasma etch reactor having a plurality of magnetsTEGAL CORP·Filed 1998·Granted Mar 12, 2002·57 cites·26 claims
- 0483US6048435APlasma etch reactor and method for emerging filmsTEGAL CORP·Filed 1996·Granted Apr 11, 2000·58 cites·45 claims
- 0579US7439188B2Reactor with heated and textured electrodes and surfacesTEGAL CORP·Filed 2001·Granted Oct 21, 2008·23 cites·12 claims
- 0679US6391148B2Cobalt silicide etch process and apparatusTEGAL CORP·Filed 2001·Granted May 21, 2002·21 cites·17 claims
- 0776US7223699B2Plasma etch reactor and methodTEGAL CORP·Filed 2005·Granted May 29, 2007·3 cites·20 claims
- 0873US5672239AIntegrated semiconductor wafer processing systemTEGAL CORP·Filed 1995·Granted Sep 30, 1997·45 cites·17 claims
- 0972US6521081B2Deposition shield for a plasma reactorTEGAL CORP·Filed 2001·Granted Feb 18, 2003·9 cites·6 claims
- 1068US6620335B1Plasma etch reactor and methodTEGAL CORP·Filed 1999·Granted Sep 16, 2003·23 cites·19 claims
- 1167US6905969B2Plasma etch reactor and methodTEGAL CORP·Filed 2002·Granted Jun 14, 2005·7 cites·17 claims
- 1261US6170431B1Plasma reactor with a deposition shieldTEGAL CORP·Filed 1999·Granted Jan 9, 2001·10 cites·23 claims
- 1360US6774046B2Method for minimizing the critical dimension growth of a feature on a semiconductor waferTEGAL CORP·Filed 2001·Granted Aug 10, 2004·6 cites·16 claims
- 1459US6492280B1Method and apparatus for etching a semiconductor wafer with features having vertical sidewallsTEGAL CORP·Filed 2000·Granted Dec 10, 2002·7 cites·41 claims
- 1559US6173674B1Plasma reactor with a deposition shieldTEGAL CORP·Filed 1999·Granted Jan 16, 2001·9 cites·26 claims
- 1658US6958295B1Method for using a hard mask for critical dimension growth containmentTEGAL CORP·Filed 2000·Granted Oct 25, 2005·5 cites·36 claims
- 1757US6287975B1Method for using a hard mask for critical dimension growth containmentTEGAL CORP·Filed 1998·Granted Sep 11, 2001·21 cites·7 claims
- 1856US6127277AMethod and apparatus for etching a semiconductor wafer with features having vertical sidewallsTEGAL CORP·Filed 1996·Granted Oct 3, 2000·21 cites·44 claims
- 1955US6410448B1Plasma etch reactor and method for emerging filmsTEGAL CORP·Filed 1999·Granted Jun 25, 2002·15 cites·15 claims
- 2054US2008318432A1Reactor with heated and textured electrodes and surfacesTEGAL CORP·Filed 2008·Application pending·0 cites
- 2151US6500314B1Plasma etch reactor and methodTEGAL CORP·Filed 1996·Granted Dec 31, 2002·11 cites·61 claims
- 2251US6360686B1Plasma reactor with a deposition shieldTEGAL CORP·Filed 1999·Granted Mar 26, 2002·6 cites·24 claims
- 2349US6046116AMethod for minimizing the critical dimension growth of a feature on a semiconductor waferTEGAL CORP·Filed 1997·Granted Apr 4, 2000·15 cites·37 claims
- 2440US6951820B2Method for using a hard mask for critical dimension growth containmentSILICON VALLEY BANK·Filed 2001·Granted Oct 4, 2005·0 cites·10 claims
- 2538US6486069B1Cobalt silicide etch process and apparatusTEGAL CORP·Filed 1999·Granted Nov 26, 2002·6 cites·38 claims
- 2621US2001001413A1Method and apparatus for increasing wafer throughput between cleanings in semiconductor processing reactorsSTEPHEN P DEORNELLAS·Filed 1998·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →