Inventor · disambiguated record
Johann W. Bartha
Also filed as: BARTHA JOHANN · BARTHA JOHANN W
18 granted patents·489 citations·filing 1988–1999
96Inventor score
Files withIBM18
Top patents by PatentIndex Score
18 records- 0189US4918033APECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluoridesIBM·Filed 1988·Granted Apr 17, 1990·84 cites·6 claims
- 0285US5635337AMethod for producing a multi-step structure in a substrateIBM·Filed 1993·Granted Jun 3, 1997·44 cites·4 claims
- 0384US5116462AMethod of producing micromechanical sensors for the afm/stm profilometryIBM·Filed 1990·Granted May 26, 1992·65 cites·19 claims
- 0475US4871418AProcess for fabricating arbitrarily shaped through holes in a componentIBM·Filed 1988·Granted Oct 3, 1989·48 cites·19 claims
- 0573US5658472AMethod for producing deep vertical structures in silicon substratesIBM·Filed 1995·Granted Aug 19, 1997·46 cites·18 claims
- 0671US5960255ACalibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing itIBM·Filed 1997·Granted Sep 28, 1999·29 cites·4 claims
- 0770US5534359ACalibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing itIBM·Filed 1994·Granted Jul 9, 1996·21 cites·8 claims
- 0867US5665905ACalibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing itIBM·Filed 1995·Granted Sep 9, 1997·25 cites·10 claims
- 0966US6218264B1Method of producing a calibration standard for 2-D and 3-D profilometry in the sub-nanometer rangeIBM·Filed 1999·Granted Apr 17, 2001·17 cites·7 claims
- 1063US6061074AIon generator for ionographic print headsIBM·Filed 1997·Granted May 9, 2000·22 cites·18 claims
- 1163US5162133AProcess for fabricating silicon carbide films with a predetermined stressIBM·Filed 1990·Granted Nov 10, 1992·22 cites·7 claims
- 1261US5717278AField emission device and method for fabricating itIBM·Filed 1995·Granted Feb 10, 1998·14 cites·12 claims
- 1348US5296091AMethod of etching substrates having a low thermal conductivityIBM·Filed 1991·Granted Mar 22, 1994·17 cites·6 claims
- 1446US4969415APECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluoridesIBM·Filed 1989·Granted Nov 13, 1990·12 cites·5 claims
- 1545US5641610AMethod for producing a multi-step structure in a substrateIBM·Filed 1996·Granted Jun 24, 1997·8 cites·21 claims
- 1636US5304278AApparatus for plasma or reactive ion etching and method of etching substrates having a low thermal conductivityIBM·Filed 1992·Granted Apr 19, 1994·8 cites·9 claims
- 1734US5707537ABulk removal, transport and storage fixture for small batch-fabricated devicesIBM·Filed 1995·Granted Jan 13, 1998·5 cites·17 claims
- 1833US5791959AMethod of fabricating a field emission deviceIBM·Filed 1996·Granted Aug 11, 1998·2 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →