Inventor · disambiguated record
Iori Yoshida
Also filed as: YOSHIDA IORI
12 granted patents·10 pending applications·18 citations·filing 2007–2024
86Inventor score
Top patents by PatentIndex Score
22 records- 0181US7618723B2Glass substrate for magnetic disk, its production method and magnetic diskASAHI GLASS CO LTD·Filed 2007·Granted Nov 17, 2009·5 cites·16 claims
- 0274US9129901B2Polishing method of non-oxide single-crystal substrateASAHI GLASS CO LTD·Filed 2013·Granted Sep 8, 2015·3 cites·9 claims
- 0372US10040972B2Single crystal silicon-carbide substrate and polishing solutionASAHI GLASS CO LTD·Filed 2017·Granted Aug 7, 2018·1 cites·20 claims
- 0471US7857680B2Method for producing glass substrate for magnetic disk, and magnetic diskASAHI GLASS CO LTD·Filed 2007·Granted Dec 28, 2010·2 cites·15 claims
- 0570US12498498B2Image processing apparatus, radiation imaging system, image processing method, and non-transitory computer-readable storage mediumCANON KK·Filed 2024·Granted Dec 16, 2025·0 cites·19 claims
- 0668US7695345B2Polishing compound for semiconductor integrated circuit device, polishing method and method for producing semiconductor integrated circuit deviceASAHI GLASS CO LTD·Filed 2007·Granted Apr 13, 2010·3 cites·21 claims
- 0764US9085714B2Polishing agent and polishing methodASAHI GLASS CO LTD·Filed 2013·Granted Jul 21, 2015·1 cites·16 claims
- 0863US8304346B2Abrasive composition and method for manufacturing semiconductor integrated circuit deviceYOSHIDA IORI·Filed 2011·Granted Nov 6, 2012·2 cites·12 claims
- 0959US8030213B2Polishing compound for semiconductor integrated circuit device, polishing method and method for producing semiconductor integrated circuit deviceASAHI GLASS CO LTD·Filed 2007·Granted Oct 4, 2011·1 cites·21 claims
- 1057US10138397B2Single-crystal silicon-carbide substrate and polishing solutionASAHI GLASS CO LTD·Filed 2017·Granted Nov 27, 2018·0 cites·15 claims
- 1153US2014220299A1Single-crystal silicon-carbide substrate and polishing solutionASAHI GLASS CO LTD·Filed 2014·Application pending·0 cites
- 1247US2010099259A1Polishing composition and method for manufacturing semiconductor integrated circuit deviceASAHI GLASS CO LTD·Filed 2009·Application pending·0 cites
- 1346US2008261400A1Polishing composition, polishing method, and method for forming copper wiring for semiconductor integrated circuitASAHI GLASS CO LTD·Filed 2008·Application pending·0 cites
- 1445US2009176373A1Polishing agent for semiconductor integrated circuit device, polishing method, and method for manufacturing semiconductor integrated circuit deviceASAHI GLASS CO LTD·Filed 2009·Application pending·0 cites
- 1545US2009181539A1Polishing agent for semiconductor integrated circuit device, polishing method, and method for manufacturing semiconductor integrated circuit deviceASAHI GLASS CO LTD·Filed 2009·Application pending·0 cites
- 1644US9481812B2Polishing agent, polishing method and additive liquid for polishingASAHI GLASS CO LTD·Filed 2015·Granted Nov 1, 2016·0 cites·15 claims
- 1743US9328261B2Polishing agent, polishing method, and manufacturing method of semiconductor integrated circuit deviceASAHI GLASS CO LTD·Filed 2014·Granted May 3, 2016·0 cites·11 claims
- 1843US2015159048A1Polishing composition and polishing methodASAHI GLASS CO LTD·Filed 2014·Application pending·0 cites
- 1943US2008086950A1Semiconductor polishing compoundASAHI GLASS CO LTD·Filed 2007·Application pending·0 cites
- 2043US2015159047A1Polishing composition and polishing methodASAHI GLASS CO LTD·Filed 2014·Application pending·0 cites
- 2142US2014187043A1Polishing agent and polishing methodASAHI GLASS CO LTD·Filed 2014·Application pending·0 cites
- 2241US2014248775A1Cleaning agent and method for producing silicon carbide single-crystal substrateASAHI GLASS CO LTD·Filed 2014·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →