Inventor · disambiguated record
Cassandra Owen
Also filed as: OWEN CASSANDRA M · OWEN CASSANDRA MAY
10 granted patents·2 pending applications·92 citations·filing 2003–2011
88Inventor score
Top patents by PatentIndex Score
12 records- 0193US7145641B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Dec 5, 2006·45 cites·18 claims
- 0290US7781149B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2006·Granted Aug 24, 2010·16 cites·33 claims
- 0382US7738075B2Lithographic attribute enhancementASML NETHERLANDS BV·Filed 2005·Granted Jun 15, 2010·7 cites·29 claims
- 0480US7906270B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2005·Granted Mar 15, 2011·6 cites·31 claims
- 0574US7248332B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jul 24, 2007·13 cites·18 claims
- 0672US7142287B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Nov 28, 2006·2 cites·10 claims
- 0771US7230674B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Jun 12, 2007·2 cites·24 claims
- 0861US8937705B2Lithographic apparatus and device manufacturing method with radiation beam inspection using moveable reflecting deviceTEL WIM TJIBBO·Filed 2009·Granted Jan 20, 2015·1 cites·26 claims
- 0948US2011244401A1Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2011·Application pending·0 cites
- 1048US2007046917A1Lithographic apparatus and device manufacturing method that compensates for reticle induced CDUASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 1147US7981595B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2005·Granted Jul 19, 2011·0 cites·32 claims
- 1231US6927835B2Adaptive thermal control of lithographic chemical processesASML NETHERLANDS BV·Filed 2003·Granted Aug 9, 2005·0 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →