Inventor · disambiguated record
Joseph E. Oberlander
Also filed as: OBERLANDER JOSEPH · OBERLANDER JOSEPH E
22 granted patents·9 pending applications·529 citations·filing 1991–2007
96Inventor score
Files withCLARIANT FINANCE BVI LTD13AZ ELECTRONIC MATERIALS USA7TOUKHY MEDHAT A2GURMAN JOSHUA1HOULIHAN FRANCIS M1
Top patents by PatentIndex Score
31 records- 0196US7824837B2Positive-working photoimageable bottom antireflective coatingAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Nov 2, 2010·54 cites·22 claims
- 0295US8088548B2Bottom antireflective coating compositionsHOULIHAN FRANCIS M·Filed 2007·Granted Jan 3, 2012·59 cites·16 claims
- 0393US6844131B2Positive-working photoimageable bottom antireflective coatingCLARIANT FINANCE BVI LTD·Filed 2002·Granted Jan 18, 2005·113 cites·23 claims
- 0491US6114085AAntireflective composition for a deep ultraviolet photoresistCLARIANT FINANCE BVI LTD·Filed 1998·Granted Sep 5, 2000·112 cites·17 claims
- 0590US7601482B2Negative photoresist compositionsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Oct 13, 2009·16 cites·23 claims
- 0688US8039202B2Positive-working photoimageable bottom antireflective coatingAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Oct 18, 2011·11 cites·19 claims
- 0776US7754414B2Antireflective coating compositionsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Jul 13, 2010·4 cites·4 claims
- 0870US6524775B1Edge bead remover for thick film photoresistsCLARIANT FINANCE BVI LTD·Filed 2000·Granted Feb 25, 2003·16 cites·18 claims
- 0969US6911293B2Photoresist compositions comprising acetals and ketals as solventsCLARIANT FINANCE BVI LTD·Filed 2002·Granted Jun 28, 2005·10 cites·26 claims
- 1069US6531267B2Process for producing acid sensitive liquid composition containing a carbonateCLARIANT FINANCE BVI LTD·Filed 2001·Granted Mar 11, 2003·9 cites·29 claims
- 1168US5225312APositive photoresist containing dyesMORTON INT INC·Filed 1991·Granted Jul 6, 1993·24 cites·8 claims
- 1265US7070914B2Process for producing an image using a first minimum bottom antireflective coating compositionAZ ELECTRONIC MATERIALS USA·Filed 2002·Granted Jul 4, 2006·18 cites·25 claims
- 1364US7264913B2Antireflective compositions for photoresistsAZ ELECTRONIC MATERIALS USA·Filed 2002·Granted Sep 4, 2007·21 cites·31 claims
- 1463US6368421B1Composition for stripping photoresist and organic materials from substrate surfacesCLARIANT FINANCE BVI LTD·Filed 1998·Granted Apr 9, 2002·24 cites·10 claims
- 1554US6106995AAntireflective coating material for photoresistsCLARIANT FINANCE BVI LTD·Filed 1999·Granted Aug 22, 2000·14 cites·17 claims
- 1651US2007270625A1Treatment of Polysilazane WasteGURMAN JOSHUA·Filed 2006·Application pending·0 cites
- 1750US2006199103A1Process for producing an image using a first minimum bottom antireflective coating compositionNEISSER MARK O·Filed 2006·Application pending·0 cites
- 1849US2006063105A1Negative-working photoimageable bottom antireflective coatingOBERLANDER JOSEPH E·Filed 2005·Application pending·0 cites
- 1947US2008032229A1Bottom antireflective coatingsTOUKHY MEDHAT A·Filed 2007·Application pending·0 cites
- 2046US5876897APositive photoresists containing novel photoactive compoundsCLARIANT FINANCE BVI LTD·Filed 1997·Granted Mar 2, 1999·9 cites·19 claims
- 2142US7078157B2Photosensitive composition and use thereofAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Jul 18, 2006·6 cites·23 claims
- 2242US2005074688A1Bottom antireflective coatingsFiled 2003·Application pending·0 cites
- 2340US2008102211A1Polysilazane-Treating Solvent and Method for Treating Polysilazane by Using Such SolventMATSUO HIDEKI·Filed 2006·Application pending·0 cites
- 2440US2003215736A1Negative-working photoimageable bottom antireflective coatingFiled 2002·Application pending·0 cites
- 2539US2005214674A1Positive-working photoimageable bottom antireflective coatingSUI YU·Filed 2004·Application pending·0 cites
- 2635US5866295APhotosensitive quinolone compounds and a process of preparationCLARIANT FINANCE BVI LTD·Filed 1997·Granted Feb 2, 1999·3 cites·9 claims
- 2735US2007105040A1Developable undercoating composition for thick photoresist layersTOUKHY MEDHAT A·Filed 2005·Application pending·0 cites
- 2832US6077942AProcess of controlling particle size of naphthoquinone diazide estersCLARIANT FINANCE BVI LTD·Filed 1997·Granted Jun 20, 2000·0 cites·2 claims
- 2932US5936071AProcess for making a photoactive compound and photoresist therefromCLARIANT FINANCE BVI LTD·Filed 1998·Granted Aug 10, 1999·1 cites·17 claims
- 3030US6048665AProcess for making a photoactive compound and photoresist therefromCLARIANT FINANCE BVI LTD·Filed 1999·Granted Apr 11, 2000·0 cites·5 claims
- 3127US6017766AProcess for measuring concentration of nonionic surfactants in an aqueous alkaline solutionCLARIANT FINANCE BVI LTD·Filed 1998·Granted Jan 25, 2000·5 cites·8 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →