Inventor · disambiguated record
Shu-Jin Wang
Also filed as: Wang shu-jin
8 granted patents·24 citations·filing 2013–2024
83Inventor score
Files withASML NETHERLANDS BV8
Top patents by PatentIndex Score
8 records- 0195US11947269B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Apr 2, 2024·2 cites·20 claims
- 0292US9594299B2Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Mar 14, 2017·13 cites·33 claims
- 0390US10811323B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Oct 20, 2020·4 cites·21 claims
- 0487US10983445B2Method and apparatus for measuring a parameter of interest using image plane detection techniquesASML NETHERLANDS BV·Filed 2019·Granted Apr 20, 2021·3 cites·20 claims
- 0586US12468235B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2024·Granted Nov 11, 2025·0 cites·20 claims
- 0682US11143972B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2018·Granted Oct 12, 2021·1 cites·21 claims
- 0775US11710668B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
- 0873US9939735B2Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Apr 10, 2018·1 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →