Inventor · disambiguated record
Kunihiro Oda
Also filed as: ODA KUNIHIRO
24 granted patents·8 pending applications·188 citations·filing 2001–2024
95Inventor score
Files withJX NIPPON MINING & METALS CORP16ODA KUNIHIRO6NIPPON MINING CO5FUKUSHIMA ATSUSHI3NIKKO MATERIALS CO LTD2
Top patents by PatentIndex Score
32 records- 0195US7740717B2Tantalum sputtering target and method for preparation thereofNIPPON MINING CO·Filed 2006·Granted Jun 22, 2010·12 cites·9 claims
- 0294US7156963B2Tantalum sputtering target and method for preparation thereofNIPPON MINING CO·Filed 2003·Granted Jan 2, 2007·27 cites·3 claims
- 0393US7716806B2Tantalum sputtering target and method for preparation thereofNIPPON MINING CO·Filed 2006·Granted May 18, 2010·13 cites·11 claims
- 0491US8425696B2Sputtering targetODA KUNIHIRO·Filed 2006·Granted Apr 23, 2013·12 cites·16 claims
- 0590US2024408671A1Tungsten sintered sputtering targetJX NIPPON MINING & METALS CORP·Filed 2024·Application pending·0 cites
- 0689US6759143B2Tantalum or tungsten target-copper alloy backing plate assembly and production method thereforNIKKO MATERIALS CO LTD·Filed 2001·Granted Jul 6, 2004·39 cites·2 claims
- 0788US8157973B2Sputtering target/backing plate bonded bodyODA KUNIHIRO·Filed 2007·Granted Apr 17, 2012·8 cites·17 claims
- 0884US11046616B2Tungsten silicide target and method of manufacturing sameJX NIPPON MINING & METALS CORP·Filed 2018·Granted Jun 29, 2021·2 cites·5 claims
- 0983US6723183B2Silicide target for depositing less embrittling gate oxide and method of manufacturing silicide targetNIKKO MATERIALS CO LTD·Filed 2001·Granted Apr 20, 2004·32 cites·16 claims
- 1080US7972583B2Iron silicide sputtering target and method for production thereofJX NIPPON MINING & METALS CORP·Filed 2010·Granted Jul 5, 2011·3 cites·8 claims
- 1175US7699948B2Ta sputtering target and method for preparation thereofNIPPON MINING CO·Filed 2003·Granted Apr 20, 2010·9 cites·9 claims
- 1274US7892367B2Tantalum sputtering targetJX NIPPON MINING & METALS CORP·Filed 2004·Granted Feb 22, 2011·12 cites·16 claims
- 1372US9732413B2Ruthenium-alloy sputtering targetODA KUNIHIRO·Filed 2006·Granted Aug 15, 2017·1 cites·14 claims
- 1469US8172960B2Tantalum sputtering target and method of manufacturing sameODA KUNIHIRO·Filed 2004·Granted May 8, 2012·12 cites·23 claims
- 1567US2011094879A1Tungsten Sintered Sputtering TargetJX NIPPON MINING & METALS CORP·Filed 2009·Application pending·0 cites
- 1666US2016148790A1Tungsten Sintered Sputtering TargetJX NIPPON MINING & METALS CORP·Filed 2016·Application pending·0 cites
- 1766US2020308692A1Master Alloy for Sputtering Target and Method for Producing Sputtering TargetJX NIPPON MINING & METALS CORP·Filed 2020·Application pending·0 cites
- 1864US10704137B2Master alloy for sputtering target and method for producing sputtering targetJX NIPPON MINING & METALS CORP·Filed 2015·Granted Jul 7, 2020·0 cites·5 claims
- 1962US10431439B2Tantalum sputtering targetJX NIPPON MINING & METALS CORP·Filed 2014·Granted Oct 1, 2019·0 cites·1 claims
- 2061US8158092B2Iron silicide powder and method for production thereofODA KUNIHIRO·Filed 2010·Granted Apr 17, 2012·0 cites·11 claims
- 2160US7740796B2Iron silicide powder and method for production thereofNIPPON MINING CO·Filed 2003·Granted Jun 22, 2010·3 cites·7 claims
- 2258US8173093B2Iron silicide sputtering target and method for production thereofODA KUNIHIRO·Filed 2003·Granted May 8, 2012·3 cites·18 claims
- 2357US9845528B2Tantalum sputtering targetFUKUSHIMA ATSUSHI·Filed 2010·Granted Dec 19, 2017·0 cites·18 claims
- 2455US10266924B2Tantalum sputtering targetFUKUSHIMA ATSUSHI·Filed 2010·Granted Apr 23, 2019·0 cites·4 claims
- 2552US10337100B2Sputtering target comprising Ni—P alloy or Ni—Pt—P alloy and production method thereforJX NIPPON MINING & METALS CORP·Filed 2015·Granted Jul 2, 2019·0 cites·4 claims
- 2651US11837449B2Ti-Nb alloy sputtering target and production method thereofJX NIPPON MINING & METALS CORP·Filed 2017·Granted Dec 5, 2023·0 cites·7 claims
- 2751US11830711B2Cobalt sputtering targetJX NIPPON MINING & METALS CORP·Filed 2015·Granted Nov 28, 2023·0 cites·3 claims
- 2846US2018305805A1Ti-Ta ALLOY SPUTTERING TARGET AND PRODUCTION METHOD THEREFORJX NIPPON MINING & METALS CORP·Filed 2017·Application pending·0 cites
- 2945US10176974B2Tungsten sputtering target and method for producing sameJX NIPPON MINING & METALS CORP·Filed 2015·Granted Jan 8, 2019·0 cites·4 claims
- 3042US2012037501A1Tantalum Sputtering TargetFUKUSHIMA ATSUSHI·Filed 2010·Application pending·0 cites
- 3136US2016333460A1Sputtering target comprising tungsten carbide or titanium carbideJX NIPPON MINING & METALS CORP·Filed 2015·Application pending·0 cites
- 3234US2016208377A1Tantalum sputtering target and method for producing sameJX NIPPON MINING & METALS CORP·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →