Inventor · disambiguated record
Arie Jeffrey Den Boef
Also filed as: DEN BOEF ARIE · DEN BOEF ARIE J · DEN BOEF ARIE JEFFREY · DEN BOEF ARIE JEFFREY MARIA
253 granted patents·31 pending applications·3,126 citations·filing 1989–2024
99Inventor score
Files withASML NETHERLANDS BV219DEN BOEF ARIE JEFFREY24ASML HOLDING NV5LOF JOERI5VAN DER SCHAAR MAURITS4
Top patents by PatentIndex Score
284 records- 0199US11640116B2Metrology method, computer product and systemASML NETHERLANDS BV·Filed 2020·Granted May 2, 2023·5 cites·20 claims
- 0299US8482845B2Lithographic apparatus and device manufacturing methodLOF JOERI·Filed 2010·Granted Jul 9, 2013·32 cites·16 claims
- 0399US7213963B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 8, 2007·196 cites·28 claims
- 0498US11822254B2Metrology apparatus and a method of determining a characteristic of interestASML NETHERLANDS BV·Filed 2020·Granted Nov 21, 2023·5 cites·17 claims
- 0598US11204239B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2020·Granted Dec 21, 2021·7 cites·36 claims
- 0698US10379445B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2018·Granted Aug 13, 2019·13 cites·20 claims
- 0798US10133188B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2016·Granted Nov 20, 2018·10 cites·25 claims
- 0898US8823922B2Overlay measurement apparatus, lithographic apparatus and device manufacturing method using such overlay measurement apparatusDEN BOEF ARIE JEFFREY·Filed 2009·Granted Sep 2, 2014·62 cites·16 claims
- 0998US8760662B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2013·Granted Jun 24, 2014·16 cites·7 claims
- 1098US8411287B2Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrateSMILDE HENDRIK JAN HIDDE·Filed 2010·Granted Apr 2, 2013·85 cites·33 claims
- 1198US8339595B2Diffraction based overlay metrology tool and methodDEN BOEF ARIE JEFFREY·Filed 2008·Granted Dec 25, 2012·84 cites·21 claims
- 1298US7791727B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2004·Granted Sep 7, 2010·89 cites·32 claims
- 1398US7791732B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2005·Granted Sep 7, 2010·80 cites·15 claims
- 1498US7486408B2Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurementASML NETHERLANDS BV·Filed 2006·Granted Feb 3, 2009·53 cites·11 claims
- 1597US11428521B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2021·Granted Aug 30, 2022·3 cites·29 claims
- 1697US10718604B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 21, 2020·6 cites·22 claims
- 1797US9778025B2Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Oct 3, 2017·21 cites·25 claims
- 1897US9110385B2Metrology method and apparatus, lithographic apparatus, and device manufacturing methodDEN BOEF ARIE JEFFREY·Filed 2009·Granted Aug 18, 2015·30 cites·18 claims
- 1997US9081303B2Methods and scatterometers, lithographic systems, and lithographic processing cellsCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2010·Granted Jul 14, 2015·73 cites·24 claims
- 2097US8054467B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2010·Granted Nov 8, 2011·15 cites·13 claims
- 2197US7791724B2Characterization of transmission losses in an optical systemASML NETHERLANDS BV·Filed 2006·Granted Sep 7, 2010·59 cites·21 claims
- 2297US6961116B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Nov 1, 2005·667 cites·23 claims
- 2396US11828585B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2022·Granted Nov 28, 2023·2 cites·36 claims
- 2496US11307024B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Apr 19, 2022·3 cites·21 claims
- 2596US10078268B2Determination of stack difference and correction using stack differenceASML NETHERLANDS BV·Filed 2017·Granted Sep 18, 2018·6 cites·26 claims
- 2696US9606442B2Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Mar 28, 2017·16 cites·17 claims
- 2796US9507907B2Computational wafer inspectionASML NETHERLANDS BV·Filed 2015·Granted Nov 29, 2016·18 cites·20 claims
- 2896US8994944B2Methods and scatterometers, lithographic systems, and lithographic processing cellsASML NETHERLANDS BV·Filed 2014·Granted Mar 31, 2015·24 cites·16 claims
- 2996US8767183B2Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cellDEN BOEF ARIE JEFFREY·Filed 2010·Granted Jul 1, 2014·16 cites·15 claims
- 3096US8670118B2Diffraction based overlay metrology tool and method of diffraction based overlay metrologyASML NETHERLANDS BV·Filed 2012·Granted Mar 11, 2014·18 cites·20 claims
- 3196US8593646B2Measuring method, measuring apparatus, lithographic apparatus and device manufacturing methodDEN BOEF ARIE JEFFREY·Filed 2012·Granted Nov 26, 2013·30 cites·18 claims
- 3296US8154708B2Lithographic apparatus and device manufacturing methodLOF JOERI·Filed 2006·Granted Apr 10, 2012·23 cites·20 claims
- 3396US7911612B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Mar 22, 2011·35 cites·32 claims
- 3496US7570358B2Angularly resolved scatterometer, inspection method, lithographic apparatus, lithographic processing cell device manufacturing method and alignment sensorASML NETHERLANDS BV·Filed 2007·Granted Aug 4, 2009·25 cites·5 claims
- 3596US7112813B2Device inspection method and apparatus using an asymmetric markerASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·61 cites·64 claims
- 3696US6384899B1Lithographic projection apparatusASM LITHOGRAPHY BV·Filed 2000·Granted May 7, 2002·103 cites·14 claims
- 3795US11947269B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Apr 2, 2024·2 cites·20 claims
- 3895US10816909B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2018·Granted Oct 27, 2020·5 cites·17 claims
- 3995US10527953B2Metrology recipe selectionASML NETHERLANDS BV·Filed 2017·Granted Jan 7, 2020·5 cites·24 claims
- 4095US10338484B2Recipe selection based on inter-recipe consistencyASML NETHERLANDS BV·Filed 2016·Granted Jul 2, 2019·10 cites·29 claims
- 4195US9222834B2Inspection apparatus and methodASML NETHERLANDS BV·Filed 2013·Granted Dec 29, 2015·14 cites·12 claims
- 4295US8842293B2Level sensor arrangement for lithographic apparatus and device manufacturing methodDEN BOEF ARIE JEFFREY·Filed 2010·Granted Sep 23, 2014·16 cites·15 claims
- 4395US8111398B2Method of measurement, an inspection apparatus and a lithographic apparatusVAN DER SCHAAR MAURITS·Filed 2010·Granted Feb 7, 2012·21 cites·21 claims
- 4495US7916284B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 29, 2011·23 cites·12 claims
- 4595US7502103B2Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrateASML NETHERLANDS BV·Filed 2006·Granted Mar 10, 2009·18 cites·24 claims
- 4695US5793737AMethod and apparatus for writing optical recording media with optimum value of write powerPHILIPS CORP·Filed 1996·Granted Aug 11, 1998·98 cites·17 claims
- 4794US11385553B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2021·Granted Jul 12, 2022·2 cites·20 claims
- 4894US10809632B2Metrology apparatus and a method of determining a characteristic of interestASML NETHERLANDS BV·Filed 2018·Granted Oct 20, 2020·4 cites·4 claims
- 4994US10579772B2Computational wafer inspectionASML NETHERLANDS BV·Filed 2018·Granted Mar 3, 2020·7 cites·20 claims
- 5094US10386176B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2015·Granted Aug 20, 2019·5 cites·20 claims
Showing the top 50 of 284 patent records by PatentIndex Score.
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