Inventor · disambiguated record
Jaihyung Won
Also filed as: WON JAIHYUNG
4 granted patents·4 pending applications·17 citations·filing 2002–2023
70Inventor score
Top patents by PatentIndex Score
8 records- 0168US9941135B2Methods of forming a hard mask layer and of fabricating a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Apr 10, 2018·2 cites·18 claims
- 0264US9812331B2Apparatus for and method of processing substrateSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Nov 7, 2017·1 cites·14 claims
- 0364US7169704B2Method of cleaning a surface of a water in connection with forming a barrier layer of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jan 30, 2007·12 cites·12 claims
- 0460US7452810B2Method of forming a barrier layer of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Nov 18, 2008·2 cites·22 claims
- 0554US2024038498A1Film deposition apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0642US2015130027A1Method of forming carbon-containing thin film and method of manufacturing semiconductor device by using the methodSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 0737US2016194756A1Semiconductor processing apparatus having gas spray unitSAMSUNG ELECTRONICS CO LTD·Filed 2015·Application pending·0 cites
- 0833US2010258526A1Methods of forming an amorphous carbon layer and methods of forming a pattern using the sameWON JAIHYUNG·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Jaihyung Won files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →