Inventor · disambiguated record
Shigehiro Fujino
Also filed as: FUJINO SHIGEHIRO
12 granted patents·1 pending application·295 citations·filing 2001–2021
91Inventor score
Top patents by PatentIndex Score
13 records- 0198US9922987B1Three-dimensional memory device containing separately formed drain select transistors and method of making thereofSANDISK TECHNOLOGIES LLC·Filed 2017·Granted Mar 20, 2018·99 cites·24 claims
- 0297US9305849B1Method of making a three dimensional NAND deviceSANDISK TECHNOLOGIES INC·Filed 2014·Granted Apr 5, 2016·47 cites·11 claims
- 0397US9305934B1Vertical NAND device containing peripheral devices on epitaxial semiconductor pedestalSANDISK TECHNOLOGIES INC·Filed 2014·Granted Apr 5, 2016·68 cites·32 claims
- 0496US9548313B2Method of making a monolithic three dimensional NAND string using a select gate etch stop layerSANDISK TECHNOLOGIES INC·Filed 2015·Granted Jan 17, 2017·25 cites·17 claims
- 0595US11935784B2Three-dimensional memory device containing self-aligned bit line contacts and methods for forming the sameSANDISK TECHNOLOGIES LLC·Filed 2021·Granted Mar 19, 2024·4 cites·20 claims
- 0695US9136130B1Three dimensional NAND string with discrete charge trap segmentsSANDISK TECHNOLOGIES INC·Filed 2014·Granted Sep 15, 2015·28 cites·22 claims
- 0779US11598005B2Deposition apparatus including an off-axis lift-and-rotation unit and methods for operating the sameSANDISK TECHNOLOGIES LLC·Filed 2020·Granted Mar 7, 2023·1 cites·13 claims
- 0873US6387835B2Dielectric ceramic composition, ceramic capacitor using the composition and method of producing thereofSAMSUNG ELECTRO MECH·Filed 2001·Granted May 14, 2002·13 cites·20 claims
- 0969US6429163B2Dielectric ceramic composition, ceramic capacitor using the composition and method of producing thereofSAMSUNG ELECTRO MECH·Filed 2001·Granted Aug 6, 2002·10 cites·20 claims
- 1046US11551961B2Multi-zone plasma-enhanced chemical vapor deposition apparatus and methods for operating the sameSANDISK TECHNOLOGIES LLC·Filed 2020·Granted Jan 10, 2023·0 cites·20 claims
- 1146US11538708B2Multi-zone plasma-enhanced chemical vapor deposition apparatus and methods for operating the sameSANDISK TECHNOLOGIES LLC·Filed 2020·Granted Dec 27, 2022·0 cites·20 claims
- 1244US2021391154A1Anisotropic etch apparatus with local etch direction adjustment capability and methods for operating the sameSANDISK TECHNOLOGIES LLC·Filed 2020·Application pending·0 cites
- 1340US6432857B2Dielectric ceramic composition, ceramic capacitor using the composition and method of producing thereofSAMSUNG ELECTRO MECH·Filed 2001·Granted Aug 13, 2002·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →