Inventor · disambiguated record
Bart Peter Bert Segers
Also filed as: SEGERS BART PETER BERT
12 granted patents·29 citations·filing 2009–2022
87Inventor score
Top patents by PatentIndex Score
12 records- 0197US11067902B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Jul 20, 2021·9 cites·20 claims
- 0294US10990018B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Apr 27, 2021·10 cites·20 claims
- 0391US11347150B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted May 31, 2022·2 cites·22 claims
- 0477US10649342B2Method and apparatus for determining a fingerprint of a performance parameterASML NETHERLANDS BV·Filed 2017·Granted May 12, 2020·2 cites·20 claims
- 0577US10571812B2Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Feb 25, 2020·2 cites·15 claims
- 0674US12461451B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted Nov 4, 2025·0 cites·20 claims
- 0771US12189302B2Computational metrologyASML NETHERLANDS BV·Filed 2022·Granted Jan 7, 2025·0 cites·22 claims
- 0868US9519224B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2012·Granted Dec 13, 2016·2 cites·19 claims
- 0964US8446564B2Lithographic apparatus and device manufacturing methodHOFMANS GERARDUS CAROLUS JOHANNUS·Filed 2009·Granted May 21, 2013·2 cites·16 claims
- 1062US11194258B2Method and apparatus for determining a fingerprint of a performance parameterASML NETHERLANDS BV·Filed 2020·Granted Dec 7, 2021·0 cites·20 claims
- 1158US11385554B2Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 12, 2022·0 cites·20 claims
- 1250US10895811B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Jan 19, 2021·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →