Inventor · disambiguated record
Geraldine C. Schwartz
Also filed as: SCHWARTZ GERALDINE C
13 granted patents·471 citations·filing 1977–1996
94Inventor score
Files withIBM13
Top patents by PatentIndex Score
13 records- 0189US4367119APlanar multi-level metal process with built-in etch stopIBM·Filed 1980·Granted Jan 4, 1983·78 cites·12 claims
- 0284US4675072ATrench etch endpoint detection by LIFIBM·Filed 1986·Granted Jun 23, 1987·74 cites·43 claims
- 0384US4352716ADry etching of copper patternsIBM·Filed 1980·Granted Oct 5, 1982·39 cites·34 claims
- 0482US5633522ACMOS transistor with two-layer inverse-T tungsten gateIBM·Filed 1996·Granted May 27, 1997·60 cites·12 claims
- 0574US4447824APlanar multi-level metal process with built-in etch stopIBM·Filed 1982·Granted May 8, 1984·36 cites·5 claims
- 0671US4132586ASelective dry etching of substratesIBM·Filed 1977·Granted Jan 2, 1979·26 cites·16 claims
- 0770US5599725AMethod for fabricating a MOS transistor with two-layer inverse-T tungsten gate structureIBM·Filed 1994·Granted Feb 4, 1997·40 cites·11 claims
- 0870US4396458AMethod for forming planar metal/insulator structuresIBM·Filed 1981·Granted Aug 2, 1983·34 cites·32 claims
- 0969US5340775AStructure and fabrication of SiCr microfusesIBM·Filed 1993·Granted Aug 23, 1994·40 cites·12 claims
- 1050US5285099ASiCr microfusesIBM·Filed 1992·Granted Feb 8, 1994·17 cites·4 claims
- 1146US4183781AStabilization process for aluminum microcircuits which have been reactive-ion etchedIBM·Filed 1978·Granted Jan 15, 1980·9 cites·4 claims
- 1239US4368220APassivation of RIE patterned al-based alloy films by etching to remove contaminants and surface oxide followed by oxidationIBM·Filed 1981·Granted Jan 11, 1983·8 cites·5 claims
- 1338US4601939AComposite insulator structureIBM·Filed 1983·Granted Jul 22, 1986·10 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →