Inventor · disambiguated record
Richard Holscher
Also filed as: HOLSCHER JR RICHARD D · HOLSCHER RICHARD · HOLSCHER RICHARD D
33 granted patents·7 pending applications·676 citations·filing 1998–2013
97Inventor score
Files withMICRON TECHNOLOGY INC31APTINA IMAGING CORP2HOELSCHER RICHARD1HOLSCHER RICHARD1SEMICONDUCTOR COMPONENTS IND1
Top patents by PatentIndex Score
40 records- 0198US6423474B1Use of DARC and BARC in flash memory processingMICRON TECHNOLOGY INC·Filed 2000·Granted Jul 23, 2002·272 cites·29 claims
- 0296US7538036B2Methods of forming openings, and methods of forming container capacitorsMICRON TECHNOLOGY INC·Filed 2005·Granted May 26, 2009·36 cites·8 claims
- 0396US7321149B2Capacitor structures, and DRAM arraysMICRON TECHNOLOGY INC·Filed 2005·Granted Jan 22, 2008·34 cites·7 claims
- 0489US7153778B2Methods of forming openings, and methods of forming container capacitorsMICRON TECHNOLOGY INC·Filed 2004·Granted Dec 26, 2006·34 cites·29 claims
- 0587US6281100B1Semiconductor processing methodsMICRON TECHNOLOGY INC·Filed 1998·Granted Aug 28, 2001·62 cites·19 claims
- 0684US7408265B2Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substratesMICRON TECHNOLOGY INC·Filed 2004·Granted Aug 5, 2008·28 cites·15 claims
- 0784US6274292B1Semiconductor processing methodsMICRON TECHNOLOGY INC·Filed 1998·Granted Aug 14, 2001·47 cites·6 claims
- 0882US8878969B2Imaging systems with color filter barriersHOELSCHER RICHARD·Filed 2012·Granted Nov 4, 2014·5 cites·19 claims
- 0981US9172892B2Imaging systems with image pixels having varying light collecting areasSEMICONDUCTOR COMPONENTS IND·Filed 2013·Granted Oct 27, 2015·5 cites·16 claims
- 1080US6461950B2Semiconductor processing methods, semiconductor circuitry, and gate stacksMICRON TECHNOLOGY INC·Filed 2001·Granted Oct 8, 2002·16 cites·19 claims
- 1180US6432591B1Overlay target design method with pitch determination to minimize impact of lens aberrationsMICRON TECHNOLOGY INC·Filed 2000·Granted Aug 13, 2002·14 cites·19 claims
- 1275US7799491B2Color filter array and imaging device containing such color filter array and method of fabricationAPTINA IMAGING CORP·Filed 2006·Granted Sep 21, 2010·3 cites·44 claims
- 1374US6815308B2Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substratesMICRON TECHNOLOGY INC·Filed 2002·Granted Nov 9, 2004·16 cites·16 claims
- 1472US7825443B2Semiconductor constructionsMICRON TECHNOLOGY INC·Filed 2005·Granted Nov 2, 2010·2 cites·10 claims
- 1565US6444588B1Anti-reflective coatings and methods regarding sameMICRON TECHNOLOGY INC·Filed 1999·Granted Sep 3, 2002·30 cites·78 claims
- 1664US6417076B1Automated combi deposition apparatus and methodMICRON TECHNOLOGY INC·Filed 2000·Granted Jul 9, 2002·10 cites·11 claims
- 1761US6756167B2Overlay target design method to minimize impact of lens aberrationsMICRON TECHNOLOGY INC·Filed 2002·Granted Jun 29, 2004·4 cites·25 claims
- 1861US6107002AReducing resist shrinkage during device fabricationMICRON TECHNOLOGY INC·Filed 1998·Granted Aug 22, 2000·19 cites·21 claims
- 1960US6469775B1Reticle for creating resist-filled vias in a dual damascene processMICRON TECHNOLOGY INC·Filed 2000·Granted Oct 22, 2002·5 cites·11 claims
- 2057US2009294878A1Circuitry and gate stacksYIN ZHIPING·Filed 2009·Application pending·0 cites
- 2155US7821142B2Intermediate semiconductor device structuresMICRON TECHNOLOGY INC·Filed 2008·Granted Oct 26, 2010·0 cites·11 claims
- 2254US6335531B1Modification of resist and/or resist processing with fluorescence detectionMICRON TECHNOLOGY INC·Filed 1999·Granted Jan 1, 2002·16 cites·47 claims
- 2353US7626238B2Semiconductor devices having antireflective materialMICRON TECHNOLOGY INC·Filed 2005·Granted Dec 1, 2009·0 cites·16 claims
- 2452US6639320B2Reticle for creating resist-filled vias in a dual damascene processMICRON TECHNOLOGY INC·Filed 2001·Granted Oct 28, 2003·2 cites·8 claims
- 2551US6461778B1In-line method of measuring effective three-leaf aberration coefficient of lithography projection systemsMICRON TECHNOLOGY INC·Filed 2000·Granted Oct 8, 2002·2 cites·26 claims
- 2651US2007238207A1Semiconductor constructionsHOLSCHER RICHARD·Filed 2005·Application pending·0 cites
- 2750US6768213B2Automated combi deposition apparatus and methodMICRON TECHNOLOGY INC·Filed 2001·Granted Jul 27, 2004·3 cites·9 claims
- 2849US7804115B2Semiconductor constructions having antireflective portionsMICRON TECHNOLOGY INC·Filed 2006·Granted Sep 28, 2010·0 cites·9 claims
- 2948US7576400B1Circuitry and gate stacksMICRON TECHNOLOGY INC·Filed 2000·Granted Aug 18, 2009·1 cites·13 claims
- 3048US6514643B2Overlay target exposure device utilizing pitch determination to minimize impact of lens aberrationsMICRON TECHNOLOGY INC·Filed 2002·Granted Feb 4, 2003·1 cites·5 claims
- 3148US6403285B1Method for exposing semiconductor wafers in a manner that promotes radial processing uniformityMICRON TECHNOLOGY INC·Filed 1999·Granted Jun 11, 2002·9 cites·32 claims
- 3248US2007238035A1Method and apparatus defining a color filter array for an image sensorMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 3346US2013222603A1Imaging systems for infrared and visible imagingAPTINA IMAGING CORP·Filed 2013·Application pending·0 cites
- 3445US9240427B2CFA resist silylation for limiting color interactions and improving crosstalkVAARTSTRA BRIAN·Filed 2011·Granted Jan 19, 2016·0 cites·13 claims
- 3545US2008204580A1Method, apparatus and system providing imaging device with color filter arrayMICRON TECHNOLOGY INC·Filed 2007·Application pending·0 cites
- 3644US6812129B2Reticle for creating resist-filled vias in a dual damascene processMICRON TECHNOLOGY INC·Filed 2003·Granted Nov 2, 2004·0 cites·24 claims
- 3744US2005020055A1Semiconductor processing methodsFiled 2004·Application pending·0 cites
- 3841US6878507B2Semiconductor processing methodsMICRON TECHNOLOGY INC·Filed 2001·Granted Apr 12, 2005·0 cites·15 claims
- 3941US2003054294A1Semiconductor processing methodsFiled 2002·Application pending·0 cites
- 4040US6580493B2Method and apparatus for exposing semiconductor wafers in a manner that promotes radial processing uniformityMICRON TECHNOLOGY INC·Filed 2001·Granted Jun 17, 2003·0 cites·18 claims
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