Inventor · disambiguated record
Tomotaka Tsuchimura
Also filed as: TSUCHIMURA TOMOTAKA
73 granted patents·31 pending applications·201 citations·filing 2001–2024
98Inventor score
Top patents by PatentIndex Score
104 records- 0197US8900791B2Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the compositionTSUCHIMURA TOMOTAKA·Filed 2011·Granted Dec 2, 2014·23 cites·21 claims
- 0295US7618683B2Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plateFUJIFILM CORP·Filed 2007·Granted Nov 17, 2009·17 cites·26 claims
- 0394US7799505B2Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive compositionFUJIFILM CORP·Filed 2007·Granted Sep 21, 2010·16 cites·16 claims
- 0493US10120281B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Nov 6, 2018·6 cites·20 claims
- 0592US10802399B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Granted Oct 13, 2020·5 cites·20 claims
- 0691US9904167B2Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Feb 27, 2018·7 cites·17 claims
- 0789US9798234B2Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo maskFUJIFILM CORP·Filed 2016·Granted Oct 24, 2017·4 cites·11 claims
- 0889US9223208B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionTSUCHIMURA TOMOTAKA·Filed 2011·Granted Dec 29, 2015·6 cites·15 claims
- 0989US8008364B2Curable compositionFUJIFILM CORP·Filed 2008·Granted Aug 30, 2011·7 cites·8 claims
- 1088US8962233B2Actinic-ray—or radiation-sensitive resin composition and method of forming pattern using the compositionKAWABATA TAKESHI·Filed 2011·Granted Feb 24, 2015·6 cites·21 claims
- 1185US9488911B2Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic deviceFUJIFILM CORP·Filed 2015·Granted Nov 8, 2016·3 cites·17 claims
- 1284US9718901B2Resin composition and pattern forming method using the sameFUJIFILM CORP·Filed 2014·Granted Aug 1, 2017·4 cites·28 claims
- 1384US8329379B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the sameITO TAKAYUKI·Filed 2010·Granted Dec 11, 2012·6 cites·21 claims
- 1484US8148044B2Positive photosensitive compositionYAMAGUCHI SHUHEI·Filed 2009·Granted Apr 3, 2012·8 cites·17 claims
- 1583US8110324B2Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensorFUJIMORI TORU·Filed 2009·Granted Feb 7, 2012·7 cites·12 claims
- 1683US7635181B2Ink for ink jet-recording curable through irradiation with a radioactive ray and method for preparing lithographic printing plates using the sameFUJIFILM CORP·Filed 2005·Granted Dec 22, 2009·5 cites·18 claims
- 1782US9235116B2Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming patternFUJIFILM CORP·Filed 2013·Granted Jan 12, 2016·3 cites·19 claims
- 1882US9069246B2Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using theseFUJIFILM CORP·Filed 2014·Granted Jun 30, 2015·3 cites·14 claims
- 1981US11953829B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Apr 9, 2024·1 cites·13 claims
- 2081US11656548B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted May 23, 2023·1 cites·21 claims
- 2181US8278386B2Dispersion composition, polymerizable composition, light-shielding color filter, solid-state image pick-up element, liquid crystal display device, wafer level lens, and image pick-up unitNAGATA YUZO·Filed 2009·Granted Oct 2, 2012·6 cites·20 claims
- 2280US8735048B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming methodINASAKI TAKESHI·Filed 2011·Granted May 27, 2014·4 cites·15 claims
- 2379US7470502B2Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plateFUJIFILM CORP·Filed 2006·Granted Dec 30, 2008·1 cites·13 claims
- 2478US9400430B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming patternFUJIFILM CORP·Filed 2014·Granted Jul 26, 2016·2 cites·23 claims
- 2578US8673538B2Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the compositionINASAKI TAKESHI·Filed 2012·Granted Mar 18, 2014·3 cites·18 claims
- 2677US9958775B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomaskFUJIFILM CORP·Filed 2014·Granted May 1, 2018·3 cites·20 claims
- 2777US8119311B2Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensorFUJIMORI TORU·Filed 2009·Granted Feb 21, 2012·4 cites·7 claims
- 2876US8637220B2Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the compositionTSUCHIMURA TOMOTAKA·Filed 2011·Granted Jan 28, 2014·2 cites·14 claims
- 2973US8889339B2Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanksTSUCHIHASHI TORU·Filed 2013·Granted Nov 18, 2014·2 cites·12 claims
- 3072US11604414B2Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Granted Mar 14, 2023·1 cites·13 claims
- 3172US8846277B2Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursorMAKINO MASAOMI·Filed 2010·Granted Sep 30, 2014·2 cites·17 claims
- 3270US8728686B2Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursorsTSUCHIMURA TOMOTAKA·Filed 2008·Granted May 20, 2014·2 cites·28 claims
- 3370US6958206B2Image recording material and lithographic printing plate precursorFUJI PHOTO FILM CO LTD·Filed 2003·Granted Oct 25, 2005·6 cites·1 claims
- 3469US10139727B2Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic deviceFUJIFILM CORP·Filed 2014·Granted Nov 27, 2018·1 cites·18 claims
- 3569US8110333B2Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compoundKAMIMURA SOU·Filed 2008·Granted Feb 7, 2012·10 cites·9 claims
- 3669US2024201589A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 3769US2024192592A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compoundFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 3868US9625813B2Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compoundFUJIFILM CORP·Filed 2013·Granted Apr 18, 2017·1 cites·20 claims
- 3968US6689534B2Planographic printing original plateFUJI PHOTO FILM CO LTD·Filed 2001·Granted Feb 10, 2004·5 cites·14 claims
- 4067US9829796B2Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Nov 28, 2017·1 cites·54 claims
- 4167US8361681B2Polymerizable compositions, color filters, production methods thereof, and solid-state imaging devicesFUJIFILM CORP·Filed 2009·Granted Jan 29, 2013·1 cites·11 claims
- 4266US8808961B2Composition, resist film, pattern forming method, and inkjet recording methodTSUCHIMURA TOMOTAKA·Filed 2010·Granted Aug 19, 2014·1 cites·15 claims
- 4365US9217919B2Photosensitive composition, pattern-forming method using the composition, and resin used in the compositionTAKAHASHI HIDENORI·Filed 2009·Granted Dec 22, 2015·1 cites·26 claims
- 4465US8211598B2Black photosensitive resin composition, and color filter and method of producing the sameEINAGA HIROYUKI·Filed 2009·Granted Jul 3, 2012·2 cites·12 claims
- 4564US8741542B2Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the sameTSUCHIMURA TOMOTAKA·Filed 2010·Granted Jun 3, 2014·1 cites·11 claims
- 4662US8895909B2Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensorFUJIFILM CORP·Filed 2013·Granted Nov 25, 2014·0 cites·19 claims
- 4758US9563121B2Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the compositionFUJIFILM CORP·Filed 2014·Granted Feb 7, 2017·0 cites·13 claims
- 4856US8535857B2Dye-containing negative curable composition, color filter, method of producing the same, and solid-state image sensorMURAKAMI YOSUKE·Filed 2008·Granted Sep 17, 2013·0 cites·17 claims
- 4956US8252490B2Color filter and solid state imaging device having a colored pattern formed from a curable compositionSHIMADA KAZUTO·Filed 2011·Granted Aug 28, 2012·0 cites·16 claims
- 5055US11467489B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Oct 11, 2022·0 cites·21 claims
Showing the top 50 of 104 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →