Inventor · disambiguated record
Antoine Gaston Marie Kiers
Also filed as: KIERS ANTOINE G M · KIERS ANTOINE GASTON MARIE
36 granted patents·6 pending applications·540 citations·filing 2003–2023
98Inventor score
Files withASML NETHERLANDS BV34CRAMER HUGO AUGUSTINUS JOSEPH2DEN BOEF ARIE JEFFREY MARIA1KIERS ANTOINE GASTON MARIE1KISTEMAN AREND JOHANNES1
Top patents by PatentIndex Score
42 records- 0198US8760662B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2013·Granted Jun 24, 2014·16 cites·7 claims
- 0298US8724087B2Inspection apparatus for lithographyVAN DE KERKHOF MARCUS ADRIANUS·Filed 2009·Granted May 13, 2014·87 cites·19 claims
- 0398US7791727B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2004·Granted Sep 7, 2010·89 cites·32 claims
- 0498US7791732B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2005·Granted Sep 7, 2010·80 cites·15 claims
- 0597US8705007B2Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection methodCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2010·Granted Apr 22, 2014·26 cites·27 claims
- 0697US8054467B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2010·Granted Nov 8, 2011·15 cites·13 claims
- 0796US7911612B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Mar 22, 2011·35 cites·32 claims
- 0896US7112813B2Device inspection method and apparatus using an asymmetric markerASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·61 cites·64 claims
- 0993US8553230B2Method and apparatus for angular-resolved spectroscopic lithography characterizationDEN BOEF ARIE JEFFREY MARIA·Filed 2011·Granted Oct 8, 2013·10 cites·8 claims
- 1092US10955353B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2019·Granted Mar 23, 2021·2 cites·7 claims
- 1191US7715019B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Granted May 11, 2010·14 cites·14 claims
- 1290US10241055B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2014·Granted Mar 26, 2019·3 cites·11 claims
- 1390US9128065B2Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection methodASML NETHERLANDS BV·Filed 2014·Granted Sep 8, 2015·5 cites·20 claims
- 1489US11379970B2Deep learning for semantic segmentation of patternASML NETHERLANDS BV·Filed 2019·Granted Jul 5, 2022·8 cites·20 claims
- 1588US7532331B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted May 12, 2009·10 cites·12 claims
- 1688US7443486B2Method for predicting a critical dimension of a feature imaged by a lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Oct 28, 2008·13 cites·35 claims
- 1787US11847570B2Deep learning for semantic segmentation of patternASML NETHERLANDS BV·Filed 2022·Granted Dec 19, 2023·1 cites·20 claims
- 1886US9454084B2Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement systemASML NETHERLANDS BV·Filed 2013·Granted Sep 27, 2016·5 cites·15 claims
- 1984US7596420B2Device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2006·Granted Sep 29, 2009·7 cites·20 claims
- 2083US7692792B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Apr 6, 2010·6 cites·24 claims
- 2182US7916927B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Mar 29, 2011·11 cites·20 claims
- 2281US7532307B2Focus determination method, device manufacturing method, and maskASML NETHERLANDS BV·Filed 2005·Granted May 12, 2009·6 cites·14 claims
- 2378US11525786B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2021·Granted Dec 13, 2022·0 cites·4 claims
- 2477US8294907B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2006·Granted Oct 23, 2012·5 cites·12 claims
- 2577US7605907B2Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration methodASML NETHERLANDS BV·Filed 2007·Granted Oct 20, 2009·6 cites·18 claims
- 2676US7312860B2Test pattern, inspection method, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 25, 2007·4 cites·2 claims
- 2774US9360769B2Method of determining focus corrections, lithographic processing cell and device manufacturing methodKISTEMAN AREND JOHANNES·Filed 2012·Granted Jun 7, 2016·3 cites·9 claims
- 2868US11966168B2Method of measuring variation, inspection system, computer program, and computer systemASML NETHERLANDS BV·Filed 2021·Granted Apr 23, 2024·0 cites·20 claims
- 2968US7630087B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 8, 2009·2 cites·16 claims
- 3061US7151594B2Test pattern, inspection method, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Dec 19, 2006·6 cites·14 claims
- 3160US8233155B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodKIERS ANTOINE GASTON MARIE·Filed 2006·Granted Jul 31, 2012·4 cites·19 claims
- 3259US2025299913A1Method and system of overlay measurement using charged-particle inspection apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3357US9360770B2Method of determining focus corrections, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Jun 7, 2016·0 cites·9 claims
- 3457US2025284209A1Method and system of overlay measurement using charged-particle inspection apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3555US11131936B2Method of measuring variation, inspection system, computer program, and computer systemASML NETHERLANDS BV·Filed 2018·Granted Sep 28, 2021·0 cites·21 claims
- 3651US12315175B2Method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the methodASML NETHERLANDS BV·Filed 2019·Granted May 27, 2025·0 cites·20 claims
- 3751US2025231129A1E-beam optimization for overlay measurement of buried featuresASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3850US2023298850A1Inspection method and inspection toolASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3949US2025200719A1Method and system for reducing charging artifact in inspection imageASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 4044US8685626B2Method of measuring a characteristicQUAEDACKERS JOHANNES ANNA·Filed 2010·Granted Apr 1, 2014·0 cites·12 claims
- 4138US8773657B2Method to determine the value of process parameters based on scatterometry dataVAN DER LAAN HANS·Filed 2005·Granted Jul 8, 2014·0 cites·36 claims
- 4236US2005185174A1Method to determine the value of process parameters based on scatterometry dataASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →