Inventor · disambiguated record
Haruhito Ono
Also filed as: ONO HARUHITO
32 granted patents·3 pending applications·741 citations·filing 1988–2011
98Inventor score
Top patents by PatentIndex Score
35 records- 0197US7126141B2Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing methodCANON KK·Filed 2005·Granted Oct 24, 2006·38 cites·4 claims
- 0297US6965153B1Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing methodCANON KK·Filed 2001·Granted Nov 15, 2005·62 cites·13 claims
- 0396US4956578ASurface conduction electron-emitting deviceCANON KK·Filed 1988·Granted Sep 11, 1990·70 cites·22 claims
- 0495US6872950B2Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing methodCANON KK·Filed 2001·Granted Mar 29, 2005·58 cites·23 claims
- 0593US7060984B2Multi-charged beam lens and charged beam exposure apparatus using the sameHITACHI HIGH TECH CORP·Filed 2004·Granted Jun 13, 2006·42 cites·16 claims
- 0693US6903345B2Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing methodCANON KK·Filed 2001·Granted Jun 7, 2005·44 cites·19 claims
- 0793US5185554AElectron-beam generator and image display apparatus making use of itCANON KK·Filed 1990·Granted Feb 9, 1993·71 cites·20 claims
- 0891US7109494B2Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflectorHITACHI HIGH TECH CORP·Filed 2004·Granted Sep 19, 2006·45 cites·25 claims
- 0989US6603128B2Charged-particle beam exposure apparatus and device manufacturing methodCANON KK·Filed 2001·Granted Aug 5, 2003·32 cites·22 claims
- 1084US8191994B2Liquid ejection head utilizing deflection membersNAKAKUBO TORU·Filed 2011·Granted Jun 5, 2012·4 cites·7 claims
- 1184US5682085AMulti-electron beam source and image display device using the sameCANON KK·Filed 1995·Granted Oct 28, 1997·70 cites·8 claims
- 1283US7700390B2Method for fabricating three-dimensional photonic crystalCANON KK·Filed 2008·Granted Apr 20, 2010·9 cites·11 claims
- 1381US8361336B2Imprint method for imprinting a pattern of a mold onto a resin material of a substrate and related substrate processing methodCANON KK·Filed 2008·Granted Jan 29, 2013·8 cites·7 claims
- 1480US6559463B2Mask pattern transfer method, mask pattern transfer apparatus using the method, and device manufacturing methodCANON KK·Filed 2000·Granted May 6, 2003·16 cites·18 claims
- 1577US6872951B2Electron optical system array, charged-particle beam exposure apparatus using the same, and device manufacturing methodCANON KK·Filed 2001·Granted Mar 29, 2005·18 cites·26 claims
- 1674US7727410B2Process for formation of three-dimensional photonic crystalCANON KK·Filed 2007·Granted Jun 1, 2010·4 cites·12 claims
- 1773US6005333AElectron beam-generating device, and image-forming apparatus and recording apparatus employing the sameCANON KK·Filed 1993·Granted Dec 21, 1999·23 cites·14 claims
- 1872US6946662B2Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing methodHITACHI LTD·Filed 2003·Granted Sep 20, 2005·11 cites·19 claims
- 1971US7611810B2Charged beam processing apparatusCANON KK·Filed 2007·Granted Nov 3, 2009·2 cites·7 claims
- 2069US7902637B2Nano structure and method of manufacturing nano structureCANON KK·Filed 2008·Granted Mar 8, 2011·2 cites·7 claims
- 2168US6011567AImage forming apparatusCANON KK·Filed 1995·Granted Jan 4, 2000·21 cites·83 claims
- 2267US8084365B2Method of manufacturing a nano structure by etching, using a substrate containing siliconMOTOI TAIKO·Filed 2010·Granted Dec 27, 2011·2 cites·6 claims
- 2366US7038226B2Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing methodCANON KK·Filed 2003·Granted May 2, 2006·4 cites·18 claims
- 2465US6872952B2Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing methodCANON KK·Filed 2001·Granted Mar 29, 2005·8 cites·25 claims
- 2563US6157137AMulti-electron beam source with driving circuit for preventing voltage spikesCANON KK·Filed 1997·Granted Dec 5, 2000·16 cites·4 claims
- 2659US5138402ASemiconductor electron emitting deviceCANON KK·Filed 1991·Granted Aug 11, 1992·13 cites·16 claims
- 2754US6335127B1Charged beam mask having strut wider than charged beam, with shape that matches charged beamCANON KK·Filed 1999·Granted Jan 1, 2002·10 cites·17 claims
- 2850US5627436AMulti-electron beam source with a cut off circuit and image device using the sameCANON KK·Filed 1995·Granted May 6, 1997·15 cites·12 claims
- 2948US8337712B2Method for forming etching mask, method for fabricating three-dimensional structure and method for fabricating three-dimensional photonic crystalline laser deviceTAMAMORI KENJI·Filed 2008·Granted Dec 25, 2012·0 cites·5 claims
- 3048US4999083AMethod of etching crystalline material with etchant injection inletCANON KK·Filed 1989·Granted Mar 12, 1991·15 cites·4 claims
- 3148US2010233432A1Imprint method and processing method of substrateCANON KK·Filed 2008·Application pending·0 cites
- 3244US5757123AElectron-beam generator and image display apparatus making use of itCANON KK·Filed 1994·Granted May 26, 1998·5 cites·21 claims
- 3344US2008298744A1Photonic crystal structure and method of manufacturing the sameCANON KK·Filed 2008·Application pending·0 cites
- 3443US2008283487A1Process for producing three-dimensional photonic crystal and the three-dimensional photonic crystalCANON KK·Filed 2008·Application pending·0 cites
- 3537US5233196AElectron beam apparatus and method for driving the sameCANON KK·Filed 1991·Granted Aug 3, 1993·3 cites·19 claims
Join the waitlist — get patent alerts
Get an alert when Haruhito Ono files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →