Inventor · disambiguated record
Frank Torregrosa
Also filed as: TORREGROSA FRANK · TORREGROSA FRANK GILBERT
10 granted patents·6 pending applications·7 citations·filing 2005–2019
80Inventor score
Top patents by PatentIndex Score
16 records- 0169US9524853B2Ion implantation machine presenting increased productivityION BEAM SERVICES·Filed 2014·Granted Dec 20, 2016·2 cites·12 claims
- 0263US9520274B2Ion implanter provided with a plurality of plasma source bodiesION BEAM SERVICES·Filed 2013·Granted Dec 13, 2016·1 cites·7 claims
- 0363US8895945B2Dose measurement device for plasma-immersion ion implantationTORREGROSA FRANK·Filed 2011·Granted Nov 25, 2014·2 cites·13 claims
- 0462US9035269B2Control module for an ion implanterION BEAM SERVICES·Filed 2012·Granted May 19, 2015·1 cites·10 claims
- 0560US9552962B2Method of controlling an ion implanter in plasma immersion modeION BEAM SERVICES·Filed 2012·Granted Jan 24, 2017·1 cites·7 claims
- 0647US12266692B2Device for improving the mobility of carriers in a MOSFET channel on silicon carbideION BEAM SERVICES·Filed 2019·Granted Apr 1, 2025·0 cites·17 claims
- 0742US10923325B2Method of controlling an implanter operating in plasma immersionION BEAM SERVICES·Filed 2016·Granted Feb 16, 2021·0 cites·5 claims
- 0841US9534287B2Machine for implanting ions in plasma immersion mode for a low-pressure methodTORREGROSA FRANK·Filed 2012·Granted Jan 3, 2017·0 cites·14 claims
- 0940US11053582B2Support including an electrostatic substrate carrierION BEAM SERVICES·Filed 2012·Granted Jul 6, 2021·0 cites·11 claims
- 1040US9922856B2Electrostatic heating substrate holder which is polarised at high voltageION BEAM SERVICES·Filed 2015·Granted Mar 20, 2018·0 cites·8 claims
- 1139US2008315127A1Ion Implanter Operating in Pulsed Plasma ModeTORREGROSA FRANK·Filed 2005·Application pending·0 cites
- 1239US2017051401A1Method for installing a gas diffusion deviceION BEAM SERVICES·Filed 2015·Application pending·0 cites
- 1338US2010012031A1Method and apparatus for optically characterizing the doping of a substrateTORREGROSA FRANK·Filed 2007·Application pending·0 cites
- 1434US2013134321A1Detector for energetic secondary electronsTORREGROSA FRANK·Filed 2011·Application pending·0 cites
- 1533US2014110607A1Ion implanter power supply which is intended to limit the loading effectTORREGROSA FRANK·Filed 2005·Application pending·0 cites
- 1632US2018031319A1A method of stabilizing a substrate and a machine for performing the methodION BEAM SERVICES·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →