Inventor · disambiguated record
Norbert Wabra
Also filed as: WABRA NORBERT
46 granted patents·12 pending applications·92 citations·filing 2004–2024
97Inventor score
Top patents by PatentIndex Score
58 records- 0193US9939730B2Optical assemblyZEISS CARL SMT GMBH·Filed 2015·Granted Apr 10, 2018·7 cites·31 claims
- 0292US9170497B2Projection exposure apparatus with at least one manipulatorZEISS CARL SMT GMBH·Filed 2013·Granted Oct 27, 2015·7 cites·21 claims
- 0392US7463423B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·9 cites·40 claims
- 0490US10401540B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2017·Granted Sep 3, 2019·3 cites·21 claims
- 0590US10048592B2Projection lens, projection exposure apparatus and projection exposure method for EUV microlithographyZEISS CARL SMT GMBH·Filed 2017·Granted Aug 14, 2018·4 cites·22 claims
- 0689US11112543B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2019·Granted Sep 7, 2021·2 cites·20 claims
- 0789US7692868B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT AG·Filed 2008·Granted Apr 6, 2010·6 cites·39 claims
- 0888US7782440B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT AG·Filed 2005·Granted Aug 24, 2010·8 cites·4 claims
- 0987US8054557B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2010·Granted Nov 8, 2011·3 cites·20 claims
- 1086US10061206B2Projection lens with wave front manipulator and related method and apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Aug 28, 2018·3 cites·18 claims
- 1185US9910364B2Projection exposure apparatus including at least one mirrorZEISS CARL SMT GMBH·Filed 2016·Granted Mar 6, 2018·3 cites·15 claims
- 1282US8879159B2Lithography projection objective, and a method for correcting image defects of the sameLOERING ULRICH·Filed 2011·Granted Nov 4, 2014·2 cites·64 claims
- 1382US8064041B2Projection objective for a microlithographic projection exposure apparatusWABRA NORBERT·Filed 2005·Granted Nov 22, 2011·5 cites·21 claims
- 1479US10001631B2Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film elementZEISS CARL SMT GMBH·Filed 2014·Granted Jun 19, 2018·6 cites·40 claims
- 1579US9316922B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2014·Granted Apr 19, 2016·1 cites·28 claims
- 1679US9134613B2Illumination and displacement device for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Sep 15, 2015·3 cites·25 claims
- 1778US10303063B2Projection exposure apparatus with at least one manipulatorZEISS CARL SMT GMBH·Filed 2017·Granted May 28, 2019·1 cites·20 claims
- 1876US11415894B2Projection exposure system for semiconductor lithography having an optical arrangementZEISS CARL SMT GMBH·Filed 2021·Granted Aug 16, 2022·1 cites·20 claims
- 1975US9436095B2Exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2012·Granted Sep 6, 2016·1 cites·22 claims
- 2074US10018907B2Method of operating a microlithographic projection apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Jul 10, 2018·2 cites·18 claims
- 2173US9817316B2Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Nov 14, 2017·1 cites·34 claims
- 2272US12025818B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
- 2372US8902407B2Projection objective for a microlithographic projection exposure apparatusWABRA NORBERT·Filed 2011·Granted Dec 2, 2014·1 cites·42 claims
- 2471US10474036B2Optical element and optical arrangement therewithZEISS CARL SMT GMBH·Filed 2016·Granted Nov 12, 2019·1 cites·24 claims
- 2570US8330935B2Exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2010·Granted Dec 11, 2012·2 cites·24 claims
- 2669US9280058B2Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Mar 8, 2016·1 cites·30 claims
- 2769US2025068089A1Optical element, and assembly and optical system therewithZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2868US10261425B2Projection exposure apparatus with a highly flexible manipulatorZEISS CARL SMT GMBH·Filed 2015·Granted Apr 16, 2019·1 cites·21 claims
- 2967US9846367B2Projection exposure apparatus with at least one manipulatorZEISS CARL SMT GMBH·Filed 2015·Granted Dec 19, 2017·1 cites·24 claims
- 3066US9348234B2Microlithographic apparatusZEISS CARL SMT GMBH·Filed 2015·Granted May 24, 2016·1 cites·22 claims
- 3166US7719658B2Imaging system for a microlithographical projection light systemZEISS CARL SMT AG·Filed 2005·Granted May 18, 2010·2 cites·27 claims
- 3266US2019072861A1Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 3365US8319944B2Projection lens system of a microlithographic projection exposure installationBEIERL HELMUT·Filed 2010·Granted Nov 27, 2012·1 cites·20 claims
- 3464US12436473B2Optical element, optical system, lithography system, and method for operating an optical elementZEISS CARL SMT GMBH·Filed 2022·Granted Oct 7, 2025·0 cites·20 claims
- 3564US2018373155A1Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 3663US9964859B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2016·Granted May 8, 2018·0 cites·32 claims
- 3762US9977338B2Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted May 22, 2018·0 cites·16 claims
- 3861US10345710B2Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2016·Granted Jul 9, 2019·0 cites·22 claims
- 3960US10591825B2Projection lens, projection exposure apparatus and projection exposure method for EUV microlithographyZEISS CARL SMT GMBH·Filed 2018·Granted Mar 17, 2020·0 cites·30 claims
- 4059US9588445B2Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 7, 2017·0 cites·11 claims
- 4159US9372411B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jun 21, 2016·1 cites·34 claims
- 4259US8174676B2Method for correcting a lithography projection objective, and such a projection objectiveULRICH WILHELM·Filed 2011·Granted May 8, 2012·1 cites·21 claims
- 4358US9470872B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2014·Granted Oct 18, 2016·1 cites·21 claims
- 4458US9164396B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT GMBH·Filed 2012·Granted Oct 20, 2015·0 cites·20 claims
- 4557US2008304033A1Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4657US2008309894A1Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4755US2018136565A1Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 4854US9709770B2Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jul 18, 2017·0 cites·14 claims
- 4953US2011228246A1Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2011·Application pending·0 cites
- 5050US9829800B2System correction from long timescalesZEISS CARL SMT GMBH·Filed 2014·Granted Nov 28, 2017·0 cites·20 claims
Showing the top 50 of 58 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →